Inventor
Wensheng Yin
Inventor
Beijing, CN
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
G01BMeasuring length, thickness or similar linear dimensions20%
G01DMeasuring not specially adapted for a specific variable14%
G05BControl or regulating systems in general6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
F16FSprings3%
G01MTesting static or dynamic balance of machines or structures3%
G02BOptical elements, systems or apparatus3%
H01JElectric discharge tubes or discharge lamps3%
H02KDynamo-electric machines3%
PatentTitleYear
9,904,183'Coarse motion and fine motion integrated reticle stage driven by planar motor'20189,903,704'Three-DOF heterodyne grating interferometer displacement measurement system'20189,885,556'Dual-frequency grating interferometer displacement measurement system'20189,879,979'Heterodyne grating interferometer displacement measurement system'20189,869,857'Optical grating phase modulator for laser interference photoetching system'20189,791,789'Magnetically suspended coarse motion and fine motion integrated reticle stage driven by planar motor'20179,766,054'Planar motor rotor displacement measuring device and its measuring method'20179,752,643'Negative stiffness system for gravity compensation of micropositioner'20179,455,650'Two-dimensional locating method of motion platform based on magnetic steel array'20169,310,797'Single degree of freedom vibration isolating device of linear motor and motion control method thereof'20169,310,782'Method for measuring displacement of planar motor rotor'20169,182,217'Method for measuring displacement of large-range moving platform'20159,030,648'Dual wafer stage exchanging system for lithographic device'20158,958,078'Two-dimensional, position-sensitive sensor-based system for positioning object having six degrees of freedom in space'20158,860,927'Dual-stage exchange system for lithographic apparatus'20148,836,918'Dual-stage exchange system for lithographic apparatus'20148,599,361'Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof'20138,284,380'Dual-stage switching system for lithographic machine'20128,084,897'Micro stage with 6 degrees of freedom'20117,339,289'Synchronous permanent magnet planar motor'20087,259,380'Scanning mechanism of an ion implanter'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2018Patents assigned to UNIV TSINGHUA (21)· patent assignee history
2007–2018Based in Beijing, CN· patent location history
2011–2016Patents assigned to YIN WENSHENG (8)· patent assignee history
2011–2016Patents assigned to ZHANG MING (8)· patent assignee history
2011–2016Patents assigned to ZHU YU (8)· patent assignee history
2011–2016Patents assigned to DUAN GUANGHONG (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV TSINGHUA | 21 | 2007–2018 |
| YIN WENSHENGself | 8 | 2011–2016 |
| ZHANG MING | 8 | 2011–2016 |
| ZHU YU | 8 | 2011–2016 |
| DUAN GUANGHONG | 7 | 2011–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beijing, CN | 21 | 2007–2018 |