LexDanaLexDanabeta
Inventor

Markus Degünther

Inventor
Aalen, DE

Overview

3→
Patents
2005–2018
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
G02BOptical elements, systems or apparatus20%
G21KHandling of particles or ionising radiation not otherwise provided for20%
PatentTitleYear
10,042,248Illumination optical unit for a mask inspection system and mask inspection system with such an illumination optical unit20189,046,787'Microlithographic projection exposure apparatus'20156,885,434'Diaphragm for an integrator unit'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005Patents assigned to ZEISS CARL SMT AG (1)· patent assignee history
2005–2018Based in Aalen, DE· patent location history
2015–2018Patents assigned to ZEISS CARL SMT GMBH (2)· patent assignee history
2015Patents assigned to DEGÜNTHER MARKUS (1)· patent assignee history
2015Patents assigned to EPPLE ALEXANDER (1)· patent assignee history
2015Patents assigned to GRUNER TORALF (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH22015–2018
DEGÜNTHER MARKUSself12015
EPPLE ALEXANDER12015
GRUNER TORALF12015
ZEISS CARL SMT AG12005
Locations
LocationPatentsSpan
Aalen, DE32005–2018