Inventor
Hitoshi Morinaga
Inventor
Kiyosu, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C09GPolishing compositions13%
C09KMaterials for miscellaneous applications, not provided for elsewhere11%
C11DDetergent compositions11%
B24BMachines, devices, or processes for grinding or polishing10%
H01LSemiconductor devices6%
Y10TTechnical subjects covered by former us classification5%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis3%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
C23CCoating metallic material2%
PatentTitleYear
10,920,104Abrasive, polishing composition, and polishing method202110,882,157Polishing pad and polishing method202110,835,805Sliding instrument and method for manufacturing same202010,450,651Article comprising metal oxide-containing coating201910,434,622Polishing tool and polishing method for member having curved surface shape20199,994,748Polishing composition20189,879,156'Polishing composition'20189,476,137'Metal oxide film, laminate, metal member and process for producing the same'20169,157,011'Polishing composition'20159,149,744'Filtration method, method for purifying polishing composition using it, method for regenerating filter to be used for filtration, and filter regenerating apparatus'20159,028,709'Surface treatment composition and surface treatment method using same'20159,028,574'Polishing composition'20158,702,472'Polishing composition and polishing method using the same'20148,632,693'Wetting agent for semiconductors, and polishing composition and polishing method employing it'20148,268,735'Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface'20128,226,924'Method for producing boehmite particles and method for producing alumina particles'20128,206,833'Metal oxide film, laminate, metal member and process for producing the same'20128,124,240'Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure'20127,621,281'Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same'20097,541,322'Cleaning solution for substrate for semiconductor device and cleaning method'20097,235,516'Semiconductor cleaning composition comprising an ethoxylated surfactant'20076,896,744'Method for cleaning a surface of a substrate'20056,498,132'Method for treating surface of substrate and surface treatment composition used for the same'20026,228,823'Method for treating surface of substrate and surface treatment composition used for the same'20016,228,179'Surface treatment composition and method for treating surface of substrate by using the same'20016,143,706'Surface treatment composition and method for treating surface of substrate by using the same'20005,885,362'Method for treating surface of substrate'19995,366,542'Polishing composition'19944,872,737'Multi-port fiberoptic rotary joint'19894,848,867'Rotary joint for polarization plane maintaining optical fibers'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2021Patents assigned to FUJIMI INC (15)· patent assignee history
1994–2009Based in Kitakyushu, JP· patent location history
1999–2016Patents assigned to MITSUBISHI CHEM CORP (12)· patent assignee history
2000–2007Based in Fukuoka, JP· patent location history
2012–2016Patents assigned to MORINAGA HITOSHI (11)· patent assignee history
2012–2016Patents assigned to OHMI TADAHIRO (4)· patent assignee history
2012–2016Patents assigned to UNIV TOHOKU (4)· patent assignee history
2012–2014Based in Ichinomiya, JP· patent location history
2014–2019Based in Kiyosu, JP· patent location history
2019–2021Based in Aichi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIMI INC | 15 | 1994–2021 |
| MITSUBISHI CHEM CORP | 12 | 1999–2016 |
| MORINAGA HITOSHIself | 11 | 2012–2016 |
| OHMI TADAHIRO | 4 | 2012–2016 |
| UNIV TOHOKU | 4 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kiyosu, JP | 8 | 2014–2019 |
| Aichi, JP | 4 | 2019–2021 |
| Kitakyushu, JP | 4 | 1994–2009 |
| Fukuoka, JP | 4 | 2000–2007 |
| Ichinomiya, JP | 2 | 2012–2014 |