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Inventor

Johannes Antonius Maria Van De Wal

Inventor
Oirschot, NL

Overview

3→
Patents
2010–2018
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
PatentTitleYear
9,971,254Sensor, lithographic apparatus and device manufacturing method20189,753,382'Sensor, lithographic apparatus and device manufacturing method'20177,755,742'Lithographic apparatus with mounted sensor'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2018Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2010–2018Based in Oirschot, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32010–2018
Locations
LocationPatentsSpan
Oirschot, NL32010–2018