Inventor
Richard L. Stocks
Inventor
Boise, ID, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1037%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01JElectric discharge tubes or discharge lamps11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H10BElectronic memory devices7%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
PatentTitleYear
8,617,975'Semiconductor processing methods'20138,367,482'Methods for fabricating contacts of semiconductor device structures and methods for designing semiconductor device structures'20138,211,787'Semiconductor processing methods'20128,153,502'Methods for filling trenches in a semiconductor material'20127,960,797'Semiconductor devices including fine pitch arrays with staggered contacts'20117,915,736'Microfeature workpieces and methods for forming interconnects in microfeature workpieces'20117,262,134'Microfeature workpieces and methods for forming interconnects in microfeature workpieces'20076,680,255'Plasma etching methods'20046,660,644'Plasma etching methods'20036,402,886'Use of a chemically active reticle carrier for photomask etching'20026,291,359'Methods of forming openings and methods of controlling the degree of taper of openings'20016,280,646'Use of a chemically active reticle carrier for photomask etching'20016,258,728'Plasma etching methods'20016,093,655'Plasma etching methods'20006,074,957'Methods of forming openings and methods of controlling the degree of taper of openings'20006,010,967'Plasma etching methods'20005,882,535'Method for forming a hole in a semiconductor device'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2013Patents assigned to MICRON TECHNOLOGY INC (17)· patent assignee history
1999–2013Based in Boise, ID, US· patent location history
2012–2013Patents assigned to STOCKS RICHARD L (3)· patent assignee history
2012–2013Patents assigned to BORTHAKUR SWARNAL (2)· patent assignee history
2012Patents assigned to HILL CHRIS (1)· patent assignee history
2013Patents assigned to KIM HYUNTAE (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 17 | 1999–2013 |
| STOCKS RICHARD Lself | 3 | 2012–2013 |
| BORTHAKUR SWARNAL | 2 | 2012–2013 |
| HILL CHRIS | 1 | 2012 |
| KIM HYUNTAE | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 17 | 1999–2013 |