Inventor
NAI-HAN CHENG
Inventor
TW
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C23CCoating metallic material13%
H01LSemiconductor devices13%
F17CVessels for containing or storing compressed, liquefied or solidified gases9%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
12,158,434Broadband wafer defect detection202411,961,707Ion implantation gas supply system202411,908,700Method for manufacturing semiconductor structure202411,852,593Broadband wafer defect detection202311,527,382Ion implantation gas supply system202211,482,422Method for manufacturing semiconductor structure202211,282,673Ion implantation system and source bushing thereof2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (7)· patent assignee history
2022–2024Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 7 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 7 | 2022–2024 |