Inventor

Daisuke Ueyama

Inventor

Tokyo, JP

Overview

2017–2020

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Jprimary

C08JWorking-up13%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients13%

C08LCompositions of macromolecular compounds13%

B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form11%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%

H05KPrinted circuits11%

Y10TTechnical subjects covered by former us classification11%

C30BSingle-crystal growth6%

C09DCoating compositions, e.g. paints, varnishes or lacquers4%

C01BNon-metallic elements2%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2017–2020Patents assigned to MITSUBISHI GAS CHEMICAL CO (7)· patent assignee history

2017–2018Patents assigned to KYOCERA CORP (3)· patent assignee history

2017–2018Patents assigned to OHTSUKA Hajime (2)· patent assignee history

2017–2018Patents assigned to SOGAME MASANOBU (2)· patent assignee history

2017–2018Patents assigned to UEYAMA DAISUKE (2)· patent assignee history

2017–2018Based in Tokyo, JP· patent location history

2017–2018Based in Kyoto, JP· patent location history

2018Based in Kashiwa, JP· patent location history

2020Based in Niigata, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations