Inventor
Yuichiro Inatomi
Inventor
Nirasaki, JP
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
C23CCoating metallic material17%
H01LSemiconductor devices15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
B05CApparatus for applying fluent materials to surfaces, in general3%
B05DProcesses for applying fluent materials to surfaces, in general3%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
Y10TTechnical subjects covered by former us classification2%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%
PatentTitleYear
11,028,483Plating method, plating apparatus and recording medium202111,004,684Forming method of hard mask202110,784,111Plating method, plating apparatus and recording medium202010,731,256Plating apparatus, plating method, and recording medium202010,354,915Adhesion layer forming method, adhesion layer forming system and recording medium201910,224,202Forming method of hard mask, forming apparatus of hard mask and recording medium201910,179,950Plating method, plated component, and plating system201910,030,308Plating method, plating system and storage medium20189,966,306Catalyst layer forming method, catalyst layer forming system and recording medium20189,922,835'Plating method, plating apparatus, and storage medium'20189,847,239Substrate processing apparatus20179,837,308Plating method, plating system and storage medium20179,777,379'Plating apparatus, plating method and storage medium'20179,761,485'Catalyst layer forming method, catalyst layer forming system, and recording medium'20179,552,994'Plating apparatus, plating method, and storage medium'20179,523,153'Pre-treatment method for plating and storage medium'20169,505,019'Plating apparatus, plating method and storage medium'20169,487,865'Plating apparatus, plating method and storage medium'20169,016,231'Substrate processing method and substrate processing system'20158,848,161'Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method'20148,728,247'Substrate processing method, storage medium storing program for executing substrate processing method and substrate processing apparatus'20148,691,497'Developing treatment method'20148,646,403'Method for improving surface roughness of processed film of substrate and apparatus for processing substrate'20148,563,230'Substrate processing method and substrate processing system'20138,420,304'Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method'20138,411,246'Resist coating and developing apparatus and method'20138,343,714'Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising the unit'20137,989,156'Substrate treatment method and substrate treatment apparatus'20117,875,420'Method for improving surface roughness of processed film of substrate and apparatus for processing substrate'20117,819,076'Substrate treatment method and substrate treatment apparatus'20107,714,979'Substrate processing apparatus'20107,600,933'Substrate processing apparatus'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2021Patents assigned to TOKYO ELECTRON LTD (31)· patent assignee history
2009–2019Based in Nirasaki, JP· patent location history
2013–2017Patents assigned to INATOMI YUICHIRO (9)· patent assignee history
2013Patents assigned to SHIRAISHI GOUSUKE (1)· patent assignee history
2014–2017Patents assigned to IWASHITA MITSUAKI (3)· patent assignee history
2014Based in Yamanashi, JP· patent location history
2016–2017Patents assigned to TANAKA TAKASHI (2)· patent assignee history
2019–2021Based in Koshi, JP· patent location history
2020–2021Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 31 | 2009–2021 |
| INATOMI YUICHIROself | 9 | 2013–2017 |
| IWASHITA MITSUAKI | 3 | 2014–2017 |
| TANAKA TAKASHI | 2 | 2016–2017 |
| SHIRAISHI GOUSUKE | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 26 | 2009–2019 |
| Koshi, JP | 3 | 2019–2021 |
| Kumamoto, JP | 2 | 2020–2021 |
| Yamanashi, JP | 1 | 2014 |