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Inventor

Hiroyuki Iino

Inventor
Nirasaki, JP

Overview

4→
Patents
1997–2000
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
B05CApparatus for applying fluent materials to surfaces, in general27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
B01DSeparation9%
PatentTitleYear
6,063,190'Method of forming coating film and apparatus therefor'20006,033,475'Resist processing apparatus'20005,942,035'Solvent and resist spin coating apparatus'19995,658,615'Method of forming coating film and apparatus therefor'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2000Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
1997–2000Patents assigned to TEL KYUSHU KK (3)· patent assignee history
1997–2000Based in Nirasaki, JP· patent location history
2000Based in Suita, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD41997–2000
TEL KYUSHU KK31997–2000
Locations
LocationPatentsSpan
Nirasaki, JP31997–2000
Suita, JP12000