Inventor

Hisashi Ohwada

Inventor
Tokyo, JP

Overview

6→
Patents
1992–2016
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus43%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form14%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof14%
H04JMultiplex communication14%
Y10TTechnical subjects covered by former us classification14%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2001Patents assigned to MITSUBISHI GAS CHEMICAL CO (5)· patent assignee history
1992–2001Based in Tokyo, JP· patent location history
2016Patents assigned to ABE MOTOYUKI (1)· patent assignee history
2016Patents assigned to HITACHI AUTOMOTIVE SYSTEMS LTD (1)· patent assignee history
2016Patents assigned to ISHIKAWA TOHRU (1)· patent assignee history
2016Patents assigned to OHWADA HISASHI (1)· patent assignee history
2016Based in Hitachi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO51992–2001
ABE MOTOYUKI12016
HITACHI AUTOMOTIVE SYSTEMS LTD12016
ISHIKAWA TOHRU12016
OHWADA HISASHIself12016
Locations
LocationPatentsSpan
Tokyo, JP51992–2001
Hitachi, JP12016