Inventor

Takuo Ohwada

Inventor

Tokyo, JP

Overview

2008–2016

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%

C11DDetergent compositions25%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis13%

H01LSemiconductor devices6%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2008–2016Patents assigned to KANTO KAGAKU (5)· patent assignee history

2008–2013Based in Tokyo, JP· patent location history

2012–2013Patents assigned to OHWADA TAKUO (2)· patent assignee history

2012Based in Saitama, JP· patent location history

2013Patents assigned to ASADA KAZUMI (1)· patent assignee history

2013Patents assigned to HAGINO YUKINO (1)· patent assignee history

2013Patents assigned to ISHIKAWA NORIO (1)· patent assignee history

2016Based in Soka, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations