Inventor
Walter D. Mieher
Inventor
Los Gatos, CA, US
Overview
Patents· 43 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
G01BMeasuring length, thickness or similar linear dimensions8%
G06TImage data processing or generation, in general7%
G06VImage or video recognition or understanding7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
H01LSemiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
G06KGraphical data reading2%
PatentTitleYear
10,451,412Apparatus and methods for detecting overlay errors using scatterometry201910,401,740System and method for focus determination using focus-sensitive overlay targets201910,352,876Signal response metrology for scatterometry based overlay measurements201910,024,654Method and system for determining in-plane distortions in a substrate20189,885,962'Methods and apparatus for measuring semiconductor device overlay using X-ray metrology'20189,702,693'Apparatus for measuring overlay errors'20179,470,639'Optical metrology with reduced sensitivity to grating anomalies'20169,347,879'Apparatus and methods for detecting overlay errors using scatterometry'20169,081,287'Methods of measuring overlay errors in area-imaging e-beam lithography'20159,030,661'Alignment measurement system'20158,452,718'Determination of training set size for a machine learning system'20138,330,281'Overlay marks, methods of overlay mark design and methods of overlay measurements'20128,040,511'Azimuth angle measurement'20117,933,016'Apparatus and methods for detecting overlay errors using scatterometry'20117,879,627'Overlay marks and methods of manufacturing such marks'20117,876,440'Apparatus and methods for detecting overlay errors using scatterometry'20117,867,693'Methods for forming device structures on a wafer'20117,826,071'Parametric profiling using optical spectroscopic systems'20107,663,753'Apparatus and methods for detecting overlay errors using scatterometry'20107,656,512'Method for determining lithographic focus and exposure'20107,616,313'Apparatus and methods for detecting overlay errors using scatterometry'20097,564,557'Apparatus and methods for detecting overlay errors using scatterometry'20097,433,040'Apparatus and methods for detecting overlay errors using scatterometry'20087,385,699'Apparatus and methods for detecting overlay errors using scatterometry'20087,382,447'Method for determining lithographic focus and exposure'20087,379,183'Apparatus and methods for detecting overlay errors using scatterometry'20087,352,453'Method for process optimization and control by comparison between 2 or more measured scatterometry signals'20087,317,531'Apparatus and methods for detecting overlay errors using scatterometry'20087,317,824'Overlay marks, methods of overlay mark design and methods of overlay measurements'20087,301,634'Apparatus and methods for detecting overlay errors using scatterometry'20077,298,481'Apparatus and methods for detecting overlay errors using scatterometry'20077,289,213'Apparatus and methods for detecting overlay errors using scatterometry'20077,280,212'Apparatus and methods for detecting overlay errors using scatterometry'20077,280,230'Parametric profiling using optical spectroscopic systems'20077,274,814'Overlay marks, methods of overlay mark design and methods of overlay measurements'20077,242,477'Apparatus and methods for detecting overlay errors using scatterometry'20077,181,057'Overlay marks, methods of overlay mark design and methods of overlay measurements'20077,175,945'Focus masking structures, focus patterns and measurements thereof'20077,177,457'Overlay marks, methods of overlay mark design and methods of overlay measurements'20077,068,833'Overlay marks, methods of overlay mark design and methods of overlay measurements'20066,985,618'Overlay marks, methods of overlay mark design and methods of overlay measurements'20066,884,552'Focus masking structures, focus patterns and measurements thereof'20056,486,954'Overlay alignment measurement mark'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2012Patents assigned to KLA TENCOR TECH CORP (26)· patent assignee history
2002–2007Based in Santa Clara, CA, US· patent location history
2006–2019Patents assigned to KLA TENCOR CORP (16)· patent assignee history
2007–2019Based in Los Gatos, CA, US· patent location history
2012–2013Patents assigned to MIEHER WALTER DEAN (2)· patent assignee history
2012Patents assigned to ADEL MICHAEL (1)· patent assignee history
2012Patents assigned to GHINOVKER MARK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR TECH CORP | 26 | 2002–2012 |
| KLA TENCOR CORP | 16 | 2006–2019 |
| MIEHER WALTER DEANself | 2 | 2012–2013 |
| ADEL MICHAEL | 1 | 2012 |
| GHINOVKER MARK | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Los Gatos, California, US | 37 | 2007–2019 |
| Santa Clara, California, US | 6 | 2002–2007 |