Inventor
Kimihiro Higuchi
Inventor
Yamanashi, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01JElectric discharge tubes or discharge lamps30%
C23CCoating metallic material16%
H01LSemiconductor devices7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
9,728,381'Plasma processor and plasma processing method'20179,437,402'Plasma processor and plasma processing method'20168,904,957'Plasma processor and plasma processing method'20148,387,562'Plasma processor and plasma processing method'20138,343,372'Surface processing method for mounting stage'20138,287,750'Plasma processing method and plasma processing apparatus'20128,056,503'Plasma procesor and plasma processing method'20117,799,238'Plasma processing method and plasma processing apparatus'20107,713,431'Plasma processing method'20107,541,283'Plasma processing method and plasma processing apparatus'20097,465,673'Method and apparatus for bilayer photoresist dry development'20087,335,278'Plasma processing apparatus and plasma processing method'20086,676,804'Method and apparatus for plasma processing'20045,980,767'Method and devices for detecting the end point of plasma process'19995,783,492'Plasma processing method, plasma processing apparatus, and plasma generating apparatus'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2017Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
1998–2017Based in Yamanashi, JP· patent location history
2004–2008Patents assigned to JAPAN SCIENCE & TECH CORP (2)· patent assignee history
2004Based in Nakakoma-gun, JP· patent location history
2009–2013Based in Nirasaki, JP· patent location history
2011–2013Patents assigned to HIGUCHI KIMIHIRO (4)· patent assignee history
2011–2013Patents assigned to GONDAI TADASHI (2)· patent assignee history
2011–2013Patents assigned to KAYAMORI SATOSHI (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 13 | 1998–2017 |
| HIGUCHI KIMIHIROself | 4 | 2011–2013 |
| GONDAI TADASHI | 2 | 2011–2013 |
| JAPAN SCIENCE & TECH CORP | 2 | 2004–2008 |
| KAYAMORI SATOSHI | 2 | 2011–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yamanashi, JP | 7 | 1998–2017 |
| Nirasaki, JP | 7 | 2009–2013 |
| Nakakoma-gun, JP | 1 | 2004 |