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Inventor

Sakae Kawaguchi

Inventor
Gunma, JP

Overview

2→
Patents
1995
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
Y10TTechnical subjects covered by former us classification25%
PatentTitleYear
5,470,621'Frame-supported pellicle for dustproof protection of photomask'19955,419,972'Frame-supported pellicle for dustproof protection of photomask'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
1995Based in Gunma, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO21995
Locations
LocationPatentsSpan
Gunma, JP21995