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Inventor

Hidekimi Fudo

Inventor
Hitachinaka, JP

Overview

2→
Patents
2011
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
8,043,772'Manufacturing method and manufacturing system of semiconductor device'20117,879,516'Manufacturing method of semiconductor integrated circuit device'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to RENESAS ELECTRONICS CORP (2)· patent assignee history
2011Based in Hitachinaka, JP· patent location history
2011Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RENESAS ELECTRONICS CORP22011
Locations
LocationPatentsSpan
Hitachinaka, JP12011
Tokyo, JP12011