Inventor
NOBUHIRO OGATA
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices19%
B05BSpraying apparatus17%
B08BCleaning in general11%
B05CApparatus for applying fluent materials to surfaces, in general8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
G05DSystems for controlling or regulating non-electric variables6%
G01FMeasuring volume, volume flow, mass flow or liquid level3%
G01MTesting static or dynamic balance of machines or structures3%
PatentTitleYear
12,515,243Substrate processing apparatus and substrate processing method202612,424,459Substrate processing apparatus and substrate processing method202512,148,632Substrate processing apparatus and cleaning method of mist guard202412,051,605Substrate processing apparatus202412,007,692Nozzle, substrate processing apparatus, and substrate processing method202411,880,213Substrate liquid processing apparatus and substrate liquid processing method202411,712,710Substrate processing apparatus and substrate processing method202311,574,827Substrate processing apparatus and substrate processing method202311,158,525Substrate processing apparatus and substrate processing method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TOKYO ELECTRON LTD (9)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 9 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 9 | 2021–2026 |