Inventor
Ulrich Schadeli
Inventor
Plasselb, CH
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
B41MPrinting, duplicating, marking, or copying processes8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C07DHeterocyclic compounds6%
G02BOptical elements, systems or apparatus6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
G03CPhotosensitive materials for photographic purposes3%
PatentTitleYear
6,867,301'Oxidation process for highly dispersible quinacridone pigments'20056,180,315'Compositions for making structured color images and application thereof'20016,120,944'Highly transparent, color-pigmented high molecular weight material'20006,063,549'Wet-chemical, developable, etch-stable photoresist for UV radiation with a wavelength below 200 nm'20006,040,108'Compositions for making structured color images and application thereof'20006,010,567'Black-pigmented structured high molecular weight material'20005,879,855'Compositions for making structured color images and application thereof'19995,397,680'Positive photoresist having improved processing properties'19955,380,881'Acid labile solution inhibitors and positive- and negative-acting photosensitive composition based thereon'19955,369,200'Positive photoresist having improved processing properties'19945,274,060'Copolymers crosslinkable by acid catalysis'19935,238,781'Photosensitive compositions based on polyphenols and acetals'19935,210,003'Acid labile dissolution inhibitors and positive- and negative-acting photosensitive composition based thereon'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1995Patents assigned to CIBA GEIGY CORP (4)· patent assignee history
1993–2005Based in Plasselb, CH· patent location history
1993–1995Based in Granges-Paccot, CH· patent location history
1994–1995Patents assigned to CIBA GEIGY AG (2)· patent assignee history
1994–1995Patents assigned to OCG MICROELECTRONICS INC (2)· patent assignee history
1999–2005Patents assigned to CIBA SC HOLDING AG (5)· patent assignee history
2000Patents assigned to ARCH SPEC CHEM INC (1)· patent assignee history
2000Based in Hockessin, DE, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CIBA SC HOLDING AG | 5 | 1999–2005 |
| CIBA GEIGY CORP | 4 | 1993–1995 |
| CIBA GEIGY AG | 2 | 1994–1995 |
| OCG MICROELECTRONICS INC | 2 | 1994–1995 |
| ARCH SPEC CHEM INC | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Plasselb, CH | 9 | 1993–2005 |
| Hockessin, Delaware, US | 2 | 2000 |
| Granges-Paccot, CH | 2 | 1993–1995 |