Inventor
Jinsu HAM
Inventor
KR
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
PatentTitleYear
11,725,076Polymer for formation of resist underlayer film, composition for formation of resist underlayer film comprising same and method for manufacturing semiconductor element by using same202311,435,667Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2023Patents assigned to SK GLOBAL CHEMICAL CO LTD (2)· patent assignee history
2022–2023Patents assigned to SK INNOVATION CO LTD (2)· patent assignee history
2022–2023Based in KR· patent location history
2023Patents assigned to SK GEO CENTRIC CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SK GLOBAL CHEMICAL CO LTD | 2 | 2022–2023 |
| SK INNOVATION CO LTD | 2 | 2022–2023 |
| SK GEO CENTRIC CO LTD | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 2 | 2022–2023 |