LexDanaLexDanabeta
Inventor

Yuichiro Nakamura

Inventor
Ibaraki, JP

Overview

52→
Patents
2002–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 52 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material12%
G11BInformation storage based on relative movement between record carrier and transducer8%
C22CAlloys7%
H04WWireless communication networks7%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys6%
Y10TTechnical subjects covered by former us classification5%
H04NPictorial communication, e.g. television4%
G06FElectric digital data processing3%
H01JElectric discharge tubes or discharge lamps3%
B22FWorking metallic powder3%
PatentTitleYear
10,877,592Display control device, display control method, and display control system202010,840,791Linear motor202010,724,859Distance-measuring device202010,715,735Head-mounted display, display control method, and program202010,685,211Head-mounted display, display control method, and program202010,534,454Head-mounted display to controller clock synchronization over EM field202010,527,848Control device, control method, and program2020D0870673Connector201910,325,761Magnetic material sputtering target and manufacturing method thereof201910,266,939Sputtering target for magnetic recording medium, and process for producing same201910,163,590Power-circuit breaking device201810,098,046Communication system, mobile device, and network apparatus201810,066,290Sintered compact magnesium oxide target for sputtering, and method for producing same2018D0824338Electrical connector20189,988,709Sintered compact magnesium oxide target for sputtering, and method for producing same20189,970,099Sputtering target for magnetic recording medium, and process for producing same20189,793,099'Magnetic material sputtering target and manufacturing method thereof'20179,761,422'Magnetic material sputtering target and manufacturing method for same'20179,732,414'Co—Cr—Pt-based sputtering target and method for producing same'20179,683,284'Sputtering target for magnetic recording film'20179,505,932'Synthetic wood meal'20169,445,310'Mobile communication system, network device, and mobile communication method'20169,328,412'Fe—Pt-based ferromagnetic material sputtering target'20169,325,112'Connector device'20169,326,198'Communication system, mobile station, and switching control method'20169,247,475'Radio control apparatus, connection destination switching method, and system'20169,181,617'Sputtering target of ferromagnetic material with low generation of particles'20159,144,021'Mobile communication system, controller and method'20159,071,941'Mobile communication system, network device, and mobile communication method'20159,034,154'Sputtering target and process for producing same'20159,034,155'Inorganic-particle-dispersed sputtering target'20158,988,888'Instrument device'20158,953,558'Mobile communication system, radio control apparatus, core network apparatus, mobile communication terminal and mobile communication method'20158,885,566'Mobile communication system, controller and method'20148,871,345'Method for producing composite pellet for extrusion molding, and composite pellet for extrusion molding produced by the method'20148,824,399'Mobile communication method and radio access network apparatus'20148,817,654'Radio controller and mobile communication method'20148,679,268'Sputtering target of ferromagnetic material with low generation of particles'20148,663,402'Sputtering target with few surface defects, and surface processing method thereof'20148,565,751'Mobile communication method, radio control station, and radio base station'20138,540,603'Vehicle power transmission control device'20137,927,434'Co-Cr-Pt-B alloy sputtering target'20117,909,949'Sputtering target with few surface defects, and surface processing method thereof'20117,771,375'Cushion and acoustic system with the cushion'20107,713,364'Manganese alloy sputtering target and method for producing the same'20107,377,762'System for producing resin molded article with spring structure'20087,229,510'Manganese alloy sputtering target and method for producing the same'20077,087,161'Resin cultivating base, water purifying device and method using resin cultivating base'20067,051,355'Receiving apparatus, receiving method, and providing medium'20066,787,595'Rubber composition and tire'20046,691,311'Digital signal receiving apparatus and receiving method'20046,470,810'Resin pallet having a spring structure and method of producing the resin pallet'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2010Based in Gifu, JP· patent location history
2004–2020Based in Tokyo, JP· patent location history
2006–2018Patents assigned to NAKAMURA YUICHIRO (21)· patent assignee history
2007–2019Based in Ibaraki, JP· patent location history
2011–2019Patents assigned to JX NIPPON MINING & METALS CORP (17)· patent assignee history
2013–2018Patents assigned to NTT DOCOMO INC (11)· patent assignee history
2013–2015Based in Zushi, JP· patent location history
2014–2018Patents assigned to AOYAGI KENICHIRO (8)· patent assignee history
2014–2016Patents assigned to MATSUTANI HIDEYUKI (7)· patent assignee history
2014–2016Based in Yokosuka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAKAMURA YUICHIROself212006–2018
JX NIPPON MINING & METALS CORP172011–2019
NTT DOCOMO INC112013–2018
AOYAGI KENICHIRO82014–2018
MATSUTANI HIDEYUKI72014–2016
Locations
LocationPatentsSpan
Ibaraki, JP192007–2019
Tokyo, JP112004–2020
Yokosuka, JP42014–2016
Zushi, JP42013–2015
Gifu, JP42002–2010