Inventor
Mitsuo Kato
Inventor
Hiroshima, JP
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material12%
H01JElectric discharge tubes or discharge lamps9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
Y02PClimate change mitigation technologies in the production or processing of goods5%
Y10TTechnical subjects covered by former us classification5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling2%
B30BPresses in general2%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors2%
C03BManufacture, shaping, or supplementary processes2%
PatentTitleYear
11,094,265Display device202110,787,664Compounds of chemically modified oligonucleotides and methods of use thereof20208,241,457'Plasma processing system, plasma measurement system, plasma measurement method, and plasma control system'20127,995,324'Electrostatic attraction apparatus for glass substrate and method of attracting and releasing the same'20117,538,050'Glass composition'20095,433,249'Hydraulic pilot valve'19955,382,871'Color selecting structure for a cathode-ray tube'19955,369,337'DC or HF ion source'19945,354,995'Substrate detecting device for detecting the presence of a transparent and/or an opaque substrate by output of judgement means'19945,317,121'Induction heating apparatus having openable and closable coil'19945,288,386'Sputtering apparatus and an ion source'19945,206,627'Substrate detecting system with edge detection, such as wafer or base material of semiconductor device or LCD'19935,182,967'Lever apparatus having a freely movable fulcrum and mechanical apparatus using the same'19935,163,832'Vertical heat-treating apparatus'19925,154,771'Hydraulic inorganic composition and molded articles thereof'19925,126,522'Induction heating apparatus for preventing the formation of stripes on plated steel'19925,030,056'Substrate transfer device'19914,655,168'Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow'19874,649,860'Vacuum evaporation coating equipment'19874,643,131'Combined continuous plating apparatus for hot-dip plating and vacuum deposition plating'1987D0287845'Front fender for an automobile'1987D0287844'Front fender for an automobile'1987D0287480'Balance panel for an automobile'1986D0287481'Balance panel for an automobile'1986D0287289'Clearance lamp for an automobile'1986D0287290'Rear combination lamp for an automobile'19864,612,206'Method of controlling deposition amount distribution in a vacuum deposition plating'19864,601,794'Method and apparatus for continuous electroplating of alloys'19864,587,134'Method of rapidly changing deposition amount in a continuous vacuum deposition process'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–2011Patents assigned to MITSUBISHI HEAVY IND LTD (11)· patent assignee history
1986–1987Patents assigned to NISSHIN STEEL CO LTD (5)· patent assignee history
1986–1987Patents assigned to TOYOTA MOTOR CO LTD (5)· patent assignee history
1986–2011Based in Hiroshima, JP· patent location history
1986–1987Based in Hachioji, JP· patent location history
1991–1993Patents assigned to TEL SAGAMI LTD (3)· patent assignee history
1991–1994Based in Sagamihara, JP· patent location history
1994–2012Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2020Based in Duarte, CA, US· patent location history
2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI HEAVY IND LTD | 11 | 1986–2011 |
| NISSHIN STEEL CO LTD | 5 | 1986–1987 |
| TOYOTA MOTOR CO LTD | 5 | 1986–1987 |
| TEL SAGAMI LTD | 3 | 1991–1993 |
| TOKYO ELECTRON LTD | 2 | 1994–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hiroshima, JP | 11 | 1986–2011 |
| Hachioji, JP | 6 | 1986–1987 |
| Sagamihara, JP | 4 | 1991–1994 |
| Tokyo, JP | 1 | 2021 |
| Duarte, California, US | 1 | 2020 |