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Inventor

SUDHIR SRIVASTAVA

Inventor
NL

Overview

2→
Patents
2021–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

F16Kprimary
F16KValves17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
G05DSystems for controlling or regulating non-electric variables17%
H01LSemiconductor devices17%
H02NElectric machines not otherwise provided for17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
12,287,570Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus202511,199,771Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2021–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22021–2025
Locations
LocationPatentsSpan
NL22021–2025