Inventor
Shu-jin WANG
Inventor
NL
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
G06TImage data processing or generation, in general23%
G01BMeasuring length, thickness or similar linear dimensions8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G06FElectric digital data processing8%
G06KGraphical data reading8%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
12,468,235Method and apparatus to determine a patterning process parameter202511,947,269Method and apparatus to determine a patterning process parameter202411,710,668Method and apparatus to determine a patterning process parameter202311,143,972Method and apparatus to determine a patterning process parameter2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2021–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 4 | 2021–2025 |