Inventor
John Robinson
Inventor
Austin, TX, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G05BControl or regulating systems in general10%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
H01LSemiconductor devices6%
G01BMeasuring length, thickness or similar linear dimensions3%
G06TImage data processing or generation, in general3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,649,447Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers202010,466,596System and method for field-by-field overlay process control using measured and estimated field parameters201910,409,171Overlay control with non-zero offset prediction20199,903,711'Feed forward of metrology data in a metrology system'20189,651,943'Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers'20179,620,426'Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation'20179,116,442'Feedforward/feedback litho process control of stress and overlay'20158,948,495'Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer'20158,804,137'Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability'20148,175,831'Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers'20128,111,376'Feedforward/feedback litho process control of stress and overlay'20127,804,994'Overlay metrology and control method'20107,679,069'Method and system for optimizing alignment performance in a fleet of exposure tools'20107,310,789'Use of overlay diagnostics for enhanced automatic process control'20077,111,256'Use of overlay diagnostics for enhanced automatic process control'20066,928,628'Use of overlay diagnostics for enhanced automatic process control'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2010Patents assigned to KLA TENCOR TECH CORP (5)· patent assignee history
2005–2020Based in Austin, TX, US· patent location history
2012–2020Patents assigned to KLA TENCOR CORP (11)· patent assignee history
2012–2017Patents assigned to ROBINSON JOHN (6)· patent assignee history
2012–2017Patents assigned to CHOI DONGSUB (5)· patent assignee history
2012–2017Patents assigned to WIDMANN AMIR (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 11 | 2012–2020 |
| ROBINSON JOHNself | 6 | 2012–2017 |
| CHOI DONGSUB | 5 | 2012–2017 |
| KLA TENCOR TECH CORP | 5 | 2005–2010 |
| WIDMANN AMIR | 5 | 2012–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 16 | 2005–2020 |