Inventor

Kazuichi Hayashi

Inventor

Kofu, JP

Overview

1999–2012

Patent span

Mechanical engineering

Primary field (CPC F)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%

C23CCoating metallic material12%

B01DSeparation8%

F04BPositive-displacement machines for liquids8%

F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids8%

F04DNon-positive-displacement pumps8%

F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants8%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%

Y02TClimate change mitigation technologies related to transportation8%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1999–2012Patents assigned to TOKYO ELECTRON LTD (10)· patent assignee history

1999–2002Based in Kofu, JP· patent location history

1999–2001Based in Yamanashi, JP· patent location history

2011–2012Based in Nirasaki, JP· patent location history

2012Patents assigned to HAYASHI KAZUICHI (1)· patent assignee history

2012Patents assigned to MIYOSHI HIDENORI (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations