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Inventor

Noriyuki Iwabuchi

Inventor
Miyagi-gun, JP

Overview

6→
Patents
2005–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1046%
H01JElectric discharge tubes or discharge lamps38%
C23CCoating metallic material8%
H01LSemiconductor devices8%
PatentTitleYear
10,460,949Substrate processing apparatus, substrate processing method and storage medium20198,475,623'Substrate processing method, system and program'20138,257,601'Substrate processing method, system and program'20128,124,539'Plasma processing apparatus, focus ring, and susceptor'20127,553,773'Pressure control method and processing device'20096,908,864'Pressure control method and processing device'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2019Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2005–2009Based in Miyagi, JP· patent location history
2012–2013Patents assigned to IWABUCHI NORIYUKI (3)· patent assignee history
2012–2013Patents assigned to KATO SHIGEAKI (3)· patent assignee history
2012–2013Patents assigned to KAISE SEIICHI (2)· patent assignee history
2012–2013Patents assigned to NAKAMURA HIROSHI (2)· patent assignee history
2012–2013Based in Miyagi-gun, JP· patent location history
2019Based in Nirasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD62005–2019
IWABUCHI NORIYUKIself32012–2013
KATO SHIGEAKI32012–2013
KAISE SEIICHI22012–2013
NAKAMURA HIROSHI22012–2013
Locations
LocationPatentsSpan
Miyagi-gun, JP32012–2013
Miyagi, JP22005–2009
Nirasaki, JP12019