Inventor
Duane Outka
Inventor
Fremont, CA, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C23CCoating metallic material11%
B08BCleaning in general9%
Y10TTechnical subjects covered by former us classification7%
B24BMachines, devices, or processes for grinding or polishing5%
C11DDetergent compositions5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
B05DProcesses for applying fluent materials to surfaces, in general3%
C25DProcesses for the electrolytic or electrophoretic production of coatings2%
PatentTitleYear
11,124,659Method to selectively pattern a surface for plasma resistant coat applications202110,967,407Conditioning chamber component20219,766,063'Method for treating a nonhomogenous surface'20179,689,533'Coating method for gas delivery system'20179,393,666'Adapter plate for polishing and cleaning electrodes'20169,387,521'Method of wet cleaning aluminum chamber parts'20169,337,002'Corrosion resistant aluminum coating on plasma chamber components'20169,120,201'Platen and adapter assemblies for facilitating silicon electrode polishing'20158,859,432'Bare aluminum baffles for resist stripping chambers'20148,852,685'Coating method for gas delivery system'20148,585,844'Extending lifetime of yttrium oxide as a plasma chamber material'20138,580,079'Electrode carrier assemblies'20138,550,880'Platen and adapter assemblies for facilitating silicon electrode polishing'20138,545,639'Method of cleaning aluminum plasma chamber parts'20138,444,456'Electrode securing platens and electrode polishing assemblies incorporating the same'20138,313,635'Bare aluminum baffles for resist stripping chambers'20128,276,604'Peripherally engaging electrode carriers and assemblies incorporating the same'20128,276,898'Electrode transporter and fixture sets incorporating the same'20128,221,552'Cleaning of bonded silicon electrodes'20128,216,388'Extending storage time of removed plasma chamber components prior to cleaning thereof'20128,171,877'Backside mounted electrode carriers and assemblies incorporating the same'20128,097,105'Extending lifetime of yttrium oxide as a plasma chamber material'20128,075,701'Processes for reconditioning multi-component electrodes'20118,075,703'Immersive oxidation and etching process for cleaning silicon electrodes'20117,976,641'Extending storage time of removed plasma chamber components prior to cleaning thereof'20117,811,409'Bare aluminum baffles for resist stripping chambers'20107,736,441'Cleaning fixtures and methods of cleaning electrode assembly plenums'20107,638,004'Method for cleaning microwave applicator tube'20096,770,214'Method of reducing aluminum fluoride deposits in plasma etch reactor'20046,350,697'Method of cleaning and conditioning plasma reaction chamber'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2021Patents assigned to LAM RES CORP (30)· patent assignee history
2002–2021Based in Fremont, CA, US· patent location history
2011–2014Patents assigned to OUTKA DUANE (15)· patent assignee history
2011–2013Patents assigned to SHIH HONG (14)· patent assignee history
2011–2013Patents assigned to AVOYAN ARMEN (10)· patent assignee history
2011–2013Patents assigned to FANG YAN (5)· patent assignee history
2012Based in Freemont, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 30 | 2002–2021 |
| OUTKA DUANEself | 15 | 2011–2014 |
| SHIH HONG | 14 | 2011–2013 |
| AVOYAN ARMEN | 10 | 2011–2013 |
| FANG YAN | 5 | 2011–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 29 | 2002–2021 |
| Freemont, California, US | 1 | 2012 |