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Inventor

Ratnasabapathy Sooriyakumaran

Inventor
Fishkill, NY, US

Overview

2→
Patents
1995–1996
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests50%
PatentTitleYear
5,482,817'Mid and deep-uv antireflection coatings and methods for use thereof'19965,380,621'Mid and deep-UV antireflection coatings and methods for use thereof'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–1996Patents assigned to IBM (2)· patent assignee history
1995–1996Based in Fishkill, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM21995–1996
Locations
LocationPatentsSpan
Fishkill, New York, US21995–1996