Inventor
Korekazu Ueyama
Inventor
Takarazuka, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H10BElectronic memory devices16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
C23CCoating metallic material11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
B01DSeparation5%
C01BNon-metallic elements5%
H10DInorganic electric semiconductor devices5%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
7,385,276'Semiconductor device, and method for manufacturing the same'20087,220,684'Semiconductor device and method of manufacturing the same'20077,166,545'Production method for semiconductor device'20077,105,459'Method for forming thin film'20067,075,170'Semiconductor device and production method therefor'20066,949,293'Mesoporous silica, mesoporous silica composite material, and processes for production thereof'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005Patents assigned to NGK INSULATORS LTD (1)· patent assignee history
2005–2007Based in Hyogo, JP· patent location history
2006–2008Patents assigned to ROHM CO LTD (5)· patent assignee history
2006–2008Based in Takarazuka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ROHM CO LTD | 5 | 2006–2008 |
| NGK INSULATORS LTD | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Takarazuka, JP | 4 | 2006–2008 |
| Hyogo, JP | 2 | 2005–2007 |