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Inventor

Christopher C. Chrobak

Inventor
San Diego, CA, US

Overview

1→
Patents
2015
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G21KHandling of particles or ionising radiation not otherwise provided for25%
H05GX-ray technique25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,119,278'System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2015Patents assigned to Cymer LLC (1)· patent assignee history
2015Based in San Diego, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12015
Cymer LLC12015
Locations
LocationPatentsSpan
San Diego, California, US12015