Inventor

Yoshinori Iketaki

Inventor
Oume, JP

Overview

32→
Patents
1991–2020
Patent span
Physics
Primary field (CPC G)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus33%
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
G21KHandling of particles or ionising radiation not otherwise provided for20%
B82YSpecific uses or applications of nanostructures7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
H01JElectric discharge tubes or discharge lamps5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G01TMeasurement of nuclear or x-radiation2%
H05GX-ray technique2%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
PatentTitleYear
10,558,028Super-resolution microscope20209,507,135'Super-resolution microscope and modulation optical element'20169,310,595'Super-resolution microscope'20168,947,658'Nonlinear optical microscope and nonlinear optical microscopy'20158,699,132'Ultra-high resolution microscope'20148,536,543'Super-resolution microscope'20138,487,271'Optical microscope configured to simultaneously irradiate the erase light and the stimulation light'20137,812,967'Microscopy method and microscope'20107,551,350'Super-resolution microscope'20097,304,315'Three dimensional analyzing device'20077,095,556'Microscope with wavelength compensation'20066,859,313'Super resolution microscope'20056,844,963'Double-resonance-absorption microscope'20056,667,830'Super-resolution microscope system and method for illumination'20036,633,432'Optical device and a microscope'20036,184,535'Method of microscopic observation'20015,835,262'Multi-wavelength optical microscope'19985,790,627'Method and apparatus for observing a specimen using an X-ray microscope'19985,650,616'Apparatus and method for analyzing surface'19975,619,382'Reflection type imaging optical system'19975,590,168'X-ray microscope'19965,533,083'Vacuum optical system'19965,528,646'Sample vessel for X-ray microscopes'19965,450,463'X-ray microscope'19955,434,901'Soft X-ray microscope'19955,432,831'Vacuum optical system'19955,352,897'Device for detecting X-rays'19945,216,699'X-ray microscope'19935,163,078'Multilayer film reflecting mirror for X-rays'19925,144,497'Swchwarzschild optical system'19925,103,100'X-ray detector'19925,022,064'X-ray optical system formed by multilayer reflecting mirrors for reflecting X-rays of different wavelengths'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2005Patents assigned to OLYMPUS OPTICAL CO (21)· patent assignee history
1991–2014Based in Oume, JP· patent location history
1992–2001Based in Ome, JP· patent location history
1998–2020Based in Tokyo, JP· patent location history
1998Based in Ohme, JP· patent location history
2003–2005Patents assigned to JAPAN SCIENCE & TECH CORP (2)· patent assignee history
2005–2007Patents assigned to JAPAN SCIENCE & TECH AGENCY (2)· patent assignee history
2007–2020Patents assigned to OLYMPUS CORP (10)· patent assignee history
2013–2015Patents assigned to IKETAKI YOSHINORI (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
OLYMPUS OPTICAL CO211991–2005
OLYMPUS CORP102007–2020
IKETAKI YOSHINORIself42013–2015
JAPAN SCIENCE & TECH AGENCY22005–2007
JAPAN SCIENCE & TECH CORP22003–2005
Locations
LocationPatentsSpan
Oume, JP211991–2014
Tokyo, JP81998–2020
Ome, JP21992–2001
Ohme, JP11998