Inventor
Sung-chul Lim
Inventor
Kyungki-do, KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry20%
Y10TTechnical subjects covered by former us classification20%
PatentTitleYear
8,114,805'Method of preparing heteropoly acid catalyst'20125,851,706'Phase shift masks including chromium oxide and alumina phase shifter patterns, and methods of manufacturing and using the same'19985,804,338'Photolithography masks including phase-shifting layers and related methods and structures'19985,741,613'Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Patents assigned to SAMSUNG ELECTRONICS CO LTD (3)· patent assignee history
1998Based in Kyungki-do, KR· patent location history
2012Patents assigned to CHO YOUNG-JIN (1)· patent assignee history
2012Patents assigned to CHOE YOUNG-HYUN (1)· patent assignee history
2012Patents assigned to CHOI BYUNG-YUL (1)· patent assignee history
2012Patents assigned to HWANG GYO-HYUN (1)· patent assignee history
2012Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 3 | 1998 |
| CHO YOUNG-JIN | 1 | 2012 |
| CHOE YOUNG-HYUN | 1 | 2012 |
| CHOI BYUNG-YUL | 1 | 2012 |
| HWANG GYO-HYUN | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyungki-do, KR | 3 | 1998 |
| Daejeon, KR | 1 | 2012 |