Inventor

Mark Wilcoxson

Inventor
Oakland, CA, US

Overview

34→
Patents
2002–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 34 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
H01JElectric discharge tubes or discharge lamps10%
H01LSemiconductor devices10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
B08BCleaning in general7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
H01QAntennas, i.e. radio aerials3%
Y10TTechnical subjects covered by former us classification3%
B24BMachines, devices, or processes for grinding or polishing2%
B82YSpecific uses or applications of nanostructures2%
PatentTitleYear
10,431,458Mask shrink layer for high aspect ratio dielectric etch201910,170,323Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch20199,673,058'Method for etching features in dielectric layers'20179,620,377'Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch'20179,543,148'Mask shrink layer for high aspect ratio dielectric etch'20179,236,279'Method of dielectric film treatment'20169,159,593'Method of particle contaminant removal'20158,900,374'Method for substrate cleaning including movement of substrate below substrate cleaning module'20148,828,145'Method of particle contaminant removal'20148,757,177'Multi-stage substrate cleaning method and apparatus'20148,534,303'Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus'20138,440,573'Method and apparatus for pattern collapse free wet processing of semiconductor devices'20138,317,934'Multi-stage substrate cleaning method and apparatus'20128,277,675'Method of damaged low-k dielectric film layer removal'20128,127,395'Apparatus for isolated bevel edge clean and method for using the same'20128,105,441'Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus'20128,021,512'Method of preventing premature drying'20117,946,303'Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus'20117,939,139'Methods for atomic layer deposition (ALD) using a proximity meniscus'20117,849,554'Apparatus and system for cleaning substrate'20107,758,404'Apparatus for cleaning edge of substrate and method for using the same'20107,632,376'Method and apparatus for atomic layer deposition (ALD) in a proximity system'20097,597,765'Post etch wafer surface cleaning with liquid meniscus'20097,568,488'Enhanced wafer cleaning method'20097,347,915'Plasma in-situ treatment of chemically amplified resist'20087,329,321'Enhanced wafer cleaning method'20087,294,580'Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition'20077,239,737'User interface for quantifying wafer non-uniformities and graphically explore significance'20077,022,611'Plasma in-situ treatment of chemically amplified resist'20066,873,112'Method for producing a semiconductor device'20056,842,147'Method and apparatus for producing uniform processing rates'20056,744,213'Antenna for producing uniform process rates'20046,518,705'Method and apparatus for producing uniform process rates'20036,341,574'Plasma processing systems'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2019Patents assigned to LAM RES CORP (34)· patent assignee history
2002–2008Based in Piedmont, CA, US· patent location history
2008–2019Based in Oakland, CA, US· patent location history
2012–2016Patents assigned to WILCOXSON MARK (9)· patent assignee history
2012–2014Patents assigned to KAWAGUCHI MARK (4)· patent assignee history
2012–2014Patents assigned to GINZBURG LEON (3)· patent assignee history
2012–2014Patents assigned to LIN CHENG-YU SEAN (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP342002–2019
WILCOXSON MARKself92012–2016
KAWAGUCHI MARK42012–2014
GINZBURG LEON32012–2014
LIN CHENG-YU SEAN32012–2014
Locations
LocationPatentsSpan
Oakland, California, US252008–2019
Piedmont, California, US92002–2008