Inventor

ALEXANDER REZNICEK

Inventor
US

Overview

242→
Patents
2021–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 242 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices26%
H10DInorganic electric semiconductor devices23%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H10BElectronic memory devices9%
B82YSpecific uses or applications of nanostructures8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10NElectric solid-state devices not otherwise provided for7%
G11CStatic stores4%
G06NComputing arrangements based on specific computational models1%
G06FElectric digital data processing1%
PatentTitleYear
12,588,216Pillar based memory (MRAM) embedded within the buried power rail within a backside power distribution network202612,588,217Programming current control for artificial intelligence (AI) devices202612,575,332CoFeB based magnetic tunnel junction device with boron encapsulation layer202612,575,330Ordered alloy magnetic tunnel junction with simplified seed structure202612,568,650Profile engineering for deep trenches in a semiconductor device202612,556,804Policy for preventing unauthorized photo capture202612,557,320FVBP without backside Si recess202612,550,625MRAM with doped silicon-germanium-tin alloy electrodes202612,550,705Self-aligned backside gate contact202612,550,371Separate gate complementary field-effect transistor202612,550,620Top electrode to metal line connection for magneto-resistive random-access memory stack height reduction202612,535,796Embedded sensor chips in 3D and 4D printed structures through selective filament infusion202612,538,786Backside contact for semiconductor device202612,490,501Vertically stacked cascode bipolar junction transistor (BJT) pair sensor202512,490,511Stacked complementary field effect transistors202512,482,750Power distribution network with backside power rail202512,484,262Tunnel field effect transistor devices202512,484,297Forksheet transistor with dual depth late cell boundary cut202512,471,364Hybrid stacked field effect transistors202512,464,796Gate induced drain leakage reduction in FinFETs202512,464,957Textured cobalt aluminum/magnesium-aluminum-oxide pedestal for memory devices202512,457,780Semiconductor device with void under source/drain region for backside contact202512,453,146Epi growth uniformity with source/drain placeholder202512,439,633VTFET with controlled fin height202512,432,968Nanowire source/drain formation for nanosheet device202512,408,369Vertical transport field effect transistors having different threshold voltages along the channel202512,402,544Antenna assisted ReRAM formation202512,402,342Nanosheet device with T-shaped dual inner spacer202512,382,682Gate-all-around nanosheet-FET with variable channel geometries for performance optimization202512,364,174Global heater for phase change memory202512,364,164Reactive serial resistance reduction for magnetoresistive random-access memory devices202512,329,045Phase change memory programming current leakage reduction202512,324,237Diffusion-break region in stacked-FET integrated circuit device202512,317,537Reduced parasitic capacitance semiconductor device containing at least one local interconnect passthrough structure202512,317,764Uniform voltage drop in arrays of memory devices202512,310,263Phase change memory gaps202512,293,469Virtual reality design navigation using a temporal collaboration dependency map202512,268,016Buried power rail formation for vertical field effect transistors202512,262,552Source/drain epitaxy process in stacked FET202512,255,106Multi-Vt nanosheet devices202512,245,530Phase change memory with concentric ring-shaped heater202512,236,539Contextual positioning in virtual space202512,237,328Minimizing shorting between FinFET epitaxial regions202512,230,676Nanosheet device with tri-layer bottom dielectric isolation202512,225,835Resistive switching device having a protective electrode ring202512,219,884Phase change memory with conductive rings202512,191,352Using different work-functions to reduce gate-induced drain leakage current in stacked nanosheet transistors202512,183,826Vertical field effect transistor with low-resistance bottom source-drain contact202412,176,434Strained semiconductor FET devices with epitaxial quality improvement202412,154,985Moon-shaped bottom spacer for vertical transport field effect transistor (VTFET) devices202412,154,899Darlington pair bipolar junction transistor sensor202412,156,395Metal gate patterning for logic and SRAM in nanosheet devices202412,155,967Contextual positioning in virtual space202412,144,270Back end of line embedded RRAM structure with grain growth enhancement202412,144,271Back end of line embedded RRAM structure with low forming voltage202412,142,526Stacked device with buried interconnect202412,136,671Gate-all-around field-effect transistor having source side lateral end portion smaller than a thickness of channel portion and drain side lateral end portion202412,127,482Multi-state SOT-MRAM structure202412,118,662Optimizing computer-based generation of three-dimensional virtual objects202412,108,686Paramagnetic hexagonal metal phase coupling spacer202412,100,744Wrap around contact process margin improvement with early contact cut202412,100,653Resistance tunable fuse structure formed by embedded thin metal layers202412,100,766Integrated short channel omega gate FinFET and long channel FinFET202412,080,714Buried local interconnect between complementary field-effect transistor cells202412,080,640Self-aligned via to metal line for interconnect202412,075,627AI accelerator with MRAM, PCM, and recessed PCM bottom electrode202412,026,605FeFET unit cells for neuromorphic computing202412,016,251Spin-orbit torque and spin-transfer torque magnetoresistive random-access memory stack202412,009,395Self-aligned block for vertical FETs202412,009,435Integrated nanosheet field effect transistors and floating gate memory cells202412,009,422Self aligned top contact for vertical transistor202411,990,412Buried power rails located in a base layer including first, second, and third etch stop layers2024RE049954Fabrication of nano-sheet transistors with different threshold voltages202411,957,069Contact resistance of a metal liner in a phase change memory cell202411,942,388Temperature-assisted device with integrated thin-film heater202411,929,404Transistor gates having embedded metal-insulator-metal capacitors202411,915,734Spin-orbit-torque magnetoresistive random-access memory with integrated diode202411,910,734Phase change memory cell with ovonic threshold switch202411,901,449Series connected stacked vertical transistors for high voltage applications202411,894,444Secure chip identification using random threshold voltage variation in a field effect transistor structure as a physically unclonable function202411,894,433Method and structure to improve stacked FET bottom EPI contact202411,887,890Partial self-aligned contact for MOL202411,881,505Tri-layer STI liner for nanosheet leakage control202411,869,983Low voltage/power junction FET with all-around junction gate202411,869,893Stacked field effect transistor with wrap-around contacts202411,869,812Stacked complementary field effect transistors202411,862,710Vertical transistor including symmetrical source/drain extension junctions202411,855,180Gate induced drain leakage reduction in FinFETs202311,855,148Vertical field effect transistor with dual threshold voltage202311,848,264Semiconductor structure with stacked vias having dome-shaped tips202311,830,877Co-integrated channel and gate formation scheme for nanosheet transistors having separately tuned threshold voltages202311,817,497Vertical field effect transistor inverter with single fin device202311,818,886Low program voltage flash memory cells with embedded heater in the control gate202311,798,867Half buried nFET/pFET epitaxy source/drain strap202311,800,698Semiconductor structure with embedded capacitor202311,791,290Physical unclonable function for secure integrated hardware systems202311,756,996Formation of wrap-around-contact for gate-all-around nanosheet FET202311,757,036Moon-shaped bottom spacer for vertical transport field effect transistor (VTFET) devices202311,742,246Local isolation of source/drain for reducing parasitic capacitance in vertical field effect transistors202311,742,425FinFET device with partial interface dipole formation for reduction of gate induced drain leakage202311,742,354Top epitaxial layer and contact for VTFET202311,735,480Transistor having source or drain formation assistance regions with improved bottom isolation202311,737,379Antenna assisted ReRAM formation202311,735,628Nanosheet metal-oxide semiconductor field effect transistor with asymmetric threshold voltage202311,737,289High density ReRAM integration with interconnect202311,715,794VTFET with cell height constraints202311,711,982Laser anneal for MRAM encapsulation enhancement202311,711,989Phase change memory202311,697,889Three-dimensionally stretchable single crystalline semiconductor membrane202311,695,004Vertical bipolar junction transistor and vertical field effect transistor with shared floating region202311,688,646Reduced source/drain coupling for CFET202311,683,941Resistive random access memory integrated with vertical transport field effect transistors202311,682,718Vertical bipolar junction transistor with all-around extrinsic base and epitaxially graded intrinsic base202311,676,894Resistance tunable fuse structure formed by embedded thin metal layers202311,665,983Phase change memory cell with ovonic threshold switch202311,664,271Dual damascene with short liner202311,664,375Minimizing shorting between FinFET epitaxial regions202311,664,455Wrap-around bottom contact for bottom source/drain202311,659,780Phase change memory structure with efficient heating system202311,646,372Vertical transistor floating body one transistor DRAM memory cell202311,646,362Vertical transport field-effect transistor structure having increased effective width and self-aligned anchor for source/drain region formation202311,631,462Temperature assisted programming of flash memory for neuromorphic computing202311,621,332Wraparound contact to a buried power rail202311,621,297Stackable symmetrical operation memory bit cell structure with bidirectional selectors202311,605,673Dual resistive random-access memory with two transistors202311,594,617Vertical reconfigurable field effect transistor202311,587,837Oxygen vacancy passivation in high-k dielectrics for vertical transport field effect transistor202311,588,103Resistive memory array202311,575,025Vertical field effect transistor with self-aligned source and drain top junction202311,575,023Secure chip identification using random threshold voltage variation in a field effect transistor structure as a physically unclonable function202311,575,028Stacked vertical transport field effect transistor electrically erasable programmable read only memory (EEPROM) devices202311,569,438Magnetoresistive random-access memory device202311,563,082Reduction of drain leakage in nanosheet device202311,557,675Reduction of bottom epitaxy parasitics for vertical transport field effect transistors202311,557,651Nanosheet transistors with inner airgaps202311,557,663Twin gate tunnel field-effect transistor (FET)202311,551,750Enhanced state dual memory cell202311,552,243MRAM structure with ternary weight storage202311,527,616Vertical transport CMOS transistors with asymmetric threshold voltage202211,527,574Stacked resistive memory with individual switch control202211,521,927Buried power rail for scaled vertical transport field effect transistor202211,515,430Tilted nanowire transistor202211,500,614Stacked FET multiply and accumulate integrated circuit202211,502,169Nanosheet semiconductor devices with n/p boundary structure202211,495,668Full air-gap spacers for gate-all-around nanosheet field effect transistors202211,495,669Full air-gap spacers for gate-all-around nanosheet field effect transistors202211,489,045Nanosheet transistor with body contact202211,476,264Stacked vertical transistor erasable programmable read-only memory and programmable inverter devices202211,456,308Low-voltage flash memory integrated with a vertical field effect transistor202211,450,659On-chip decoupling capacitor202211,444,165Asymmetric threshold voltages in semiconductor devices202211,444,185III-V lateral bipolar junction transistor on local facetted buried oxide layer202211,437,502III-V lateral bipolar junction transistor on local facetted buried oxide layer202211,430,660Confined work function material for gate-all around transistor devices202211,430,514Setting an upper bound on RRAM resistance202211,424,361Stacked vertical tunnel FET methods202211,424,403Magnetoresistive random-access memory cell having a metal line connection202211,411,049Symmetric read operation resistive random-access memory cell with bipolar junction selector202211,411,048Magnetoresistive random-access memory device structure202211,404,581Wimpy vertical transport field effect transistor with dipole liners202211,398,480Transistor having forked nanosheets with wraparound contacts202211,387,342Multi threshold voltage for nanosheet202211,380,641Pillar bump with noble metal seed layer for advanced heterogeneous integration202211,374,167Reducing parasitic bottom electrode resistance of embedded MRAM202211,362,194Transistor having confined source/drain regions with wrap-around source/drain contacts202211,362,086Diode connected vertical transistor202211,355,633Vertical field effect transistor with bottom source-drain region202211,355,553Resistive random access memory integrated under a vertical field effect transistor202211,349,029Structure to enable titanium contact liner on pFET source/drain regions202211,348,999Nanosheet semiconductor devices with sigma shaped inner spacer202211,335,804Scalable vertical transistor bottom source-drain epitaxy202211,329,167Fishbone long channel nanosheet device202211,329,142Vertical transistor with body contact202211,322,359Single process for liner and metal fill202211,315,938Stacked nanosheet rom202211,315,923Stacked nanosheet inverter202211,309,216Large grain copper interconnect lines for MRAM202211,302,794FinFET with dual work function metal202211,302,813Wrap around contact for nanosheet source drain epitaxy202211,295,983Transistor having source or drain formation assistance regions with improved bottom isolation202211,295,988Semiconductor FET device with bottom isolation and high-k first202211,289,484Forming source and drain regions for sheet transistors202211,282,947Heterojunction bipolar transistor with a silicon oxide layer on a silicon germanium base202211,276,576Gate metal patterning to avoid gate stack attack due to excessive wet etching202211,271,108Low-noise gate-all-around junction field effect transistor202211,271,107Reduction of bottom epitaxy parasitics for vertical transport field effect transistors202211,270,910Interconnect structure with partial sidewall liner202211,251,301Cross-bar vertical transport field effect transistors without corner rounding202211,251,185Stacked complementary junction FETs for analog electronic circuits202211,251,094Oxygen vacancy passivation in high-k dielectrics for vertical transport field effect transistor202211,251,304Wrap-around bottom contact for bottom source/drain202211,244,864Reducing parasitic capacitance within semiconductor devices202211,245,009Asymmetric channel FinFETs with wrap around channel202211,245,025Gate last vertical transport field effect transistor202211,239,115Partial self-aligned contact for MOL202211,239,343Vertical transistor including symmetrical source/drain extension junctions202211,239,359Fabricating a gate-all-around (GAA) field effect transistor having threshold voltage asymmetry by thinning source side lateral end portion of the nanosheet layer202211,239,414Physical unclonable function for MRAM structures202211,233,137Transistors and methods of forming transistors using vertical nanowires202211,227,923Wrap around contact process margin improvement with early contact cut202211,226,252Multilayered magnetic free layer structure in magnetic tunnel junction arrays for sub-micrometer resolution pressure sensors202211,227,922Sloped epitaxy buried contact202211,222,979Field-effect transistor devices with sidewall implant under bottom dielectric isolation202211,222,922Resistive random access memory cells integrated with shared-gate vertical field effect transistors202211,205,698Multiple work function nanosheet transistors with inner spacer modulation202111,205,728Vertical field effect transistor with reduced parasitic capacitance202111,201,242Structure to enable titanium contact liner on pFET source/drain regions202111,201,092Gate channel length control in VFET202111,201,153Stacked field effect transistor with wrap-around contacts202111,201,241Vertical field effect transistor and method of manufacturing a vertical field effect transistor202111,196,000Low forming voltage non-volatile memory (NVM)202111,189,725VTFET with cell height constraints202111,189,712Formation of vertical transport field-effect transistor structure having increased effective width202111,187,672Superhydrophobic electrode and biosensing device using the same202111,189,661FinFET 2T2R RRAM202111,189,701Bipolar junction transistor with vertically integrated resistor202111,183,632Self-aligned edge passivation for robust resistive random access memory connection202111,183,558Nanosheet transistor having partially self-limiting bottom isolation extending into the substrate and under the source/drain and gate regions202111,177,225Semiconductor device including physical unclonable function202111,177,372Stacked vertical transport field effect transistor electrically erasable programmable read only memory (EEPROM) devices202111,177,370Vertical field effect transistor with self-aligned source and drain top junction202111,177,258Stacked nanosheet CFET with gate all around structure202111,177,366Gate induced drain leakage reduction in FinFETs202111,165,017Replacement bottom electrode structure process to form misalignment tolerate MRAM with high yield202111,164,792Complementary field-effect transistors202111,164,960Transistor having in-situ doped nanosheets with gradient doped channel regions202111,164,782Self-aligned gate contact compatible cross couple contact formation202111,164,907Resistive random access memory integrated with stacked vertical transistors202111,164,793Reduced source/drain coupling for CFET202111,164,787Two-stage top source drain epitaxy formation for vertical field effect transistors enabling gate last formation202111,158,715Vertical FET with asymmetric threshold voltage and channel thicknesses202111,158,756FinFET radiation dosimeter202111,158,636Nanosheet device integrated with a FINFET transistor202111,158,729Stacked vertical transport field effect transistor electrically erasable programmable read only memory (EEPROM) devices202111,158,538Interconnect structures with cobalt-infused ruthenium liner and a cobalt cap202111,152,264Multi-Vt scheme with same dipole thickness for gate-all-around transistors202111,152,265Local isolation of source/drain for reducing parasitic capacitance in vertical field effect transistors202111,152,478Vertical transistors with buried metal silicide bottom contact202111,152,510Long channel optimization for gate-all-around transistors202111,145,668EEPROM cell and array having stacked nanosheet field effect transistors with a common floating gate202111,145,380Analog nonvolatile memory cells using dopant activation202111,145,816Resistive random access memory cells integrated with vertical field effect transistor2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to IBM (236)· patent assignee history
2021–2026Based in US· patent location history
2022Patents assigned to ELPIS TECH INC (1)· patent assignee history
2022Patents assigned to GLOBALFOUNDRIES US INC (1)· patent assignee history
2023–2024Patents assigned to TESSERA LLC (2)· patent assignee history
2025Patents assigned to ADEIA SEMICONDUCTOR SOLUTIONS LLC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM2362021–2026
TESSERA LLC22023–2024
ADEIA SEMICONDUCTOR SOLUTIONS LLC12025
ELPIS TECH INC12022
GLOBALFOUNDRIES US INC12022
Locations
LocationPatentsSpan
US2422021–2026