Inventor
Ta-Hung Yang
Inventor
Hsinchu, TW
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H10BElectronic memory devices9%
H10DInorganic electric semiconductor devices9%
H01JElectric discharge tubes or discharge lamps7%
H01LSemiconductor devices7%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
B82YSpecific uses or applications of nanostructures2%
C23CCoating metallic material2%
PatentTitleYear
10,497,652Semiconductor substrate and semiconductor device201910,388,664Integrated circuit device with layered trench conductors20199,905,509'Inverted-T shaped via for reducing adverse stress-migration effects'20189,252,153'Method of word-line formation by semi-damascene process with thin protective conductor layer'20169,236,219'Measurement of line-edge-roughness and line-width-roughness on pre-layered structures'20168,653,592'Isolation structure, non-volatile memory having the same, and method of fabricating the same'20148,519,541'Semiconductor device having plural conductive layers disposed within dielectric layer'20138,520,194'Method of forming a deposited material by utilizing a multi-step deposition/etch/deposition (D/E/D) process'20138,184,288'Method of depositing a silicon-containing material by utilizing a multi-step fill-in process in a deposition machine'20128,085,390'Multivariate monitoring method for plasma process machine'20118,072,577'Lithography systems and processes'20118,067,292'Isolation structure, non-volatile memory having the same, and method of fabricating the same'20118,034,691'HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system'20117,960,835'Fabrication of metal film stacks having improved bottom critical dimension'20117,939,451'Method for fabricating a pattern'20117,846,835'Contact barrier layer deposition process'20107,786,023'Metal pad formation method and metal pad structure using the same'20107,648,921'Method of forming dielectric layer'20107,632,616'Controlling system and method for operating the same'20097,625,819'Interconnection process'20096,969,642'Method of controlling implantation dosages during coding of read-only memory devices'20056,875,659'Methods of code programming a mask ROM'20056,864,185'Fine line printing by trimming the sidewalls of pre-developed resist image'20056,821,684'Method for fabricating mask ROM with self-aligned coding'20046,799,152'Critical dimension statistical process control in semiconductor fabrication'20045,883,001'Integrated circuit passivation process and structure'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2019Patents assigned to MACRONIX INT CO LTD (26)· patent assignee history
1999Based in Tai Chung, TW· patent location history
2004–2019Based in Hsinchu, TW· patent location history
2009–2010Based in Miaoli, TW· patent location history
2011–2014Patents assigned to CHEN KUANG-CHAO (6)· patent assignee history
2011–2014Patents assigned to LUOH TUUNG (6)· patent assignee history
2011–2014Patents assigned to SU CHIN-TA (6)· patent assignee history
2011–2014Patents assigned to YANG TA-HUNG (6)· patent assignee history
2011–2019Based in Miao-Li County, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MACRONIX INT CO LTD | 26 | 1999–2019 |
| CHEN KUANG-CHAO | 6 | 2011–2014 |
| LUOH TUUNG | 6 | 2011–2014 |
| SU CHIN-TA | 6 | 2011–2014 |
| YANG TA-HUNGself | 6 | 2011–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 19 | 2004–2019 |
| Miao-Li County, TW | 4 | 2011–2019 |
| Miaoli, TW | 2 | 2009–2010 |
| Tai Chung, TW | 1 | 1999 |