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Inventor

Kuno Mayer

Inventor
Frankfurt am Main, DE

Overview

2→
Patents
2013–2014
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Fprimary
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation33%
C11DDetergent compositions17%
C23CCoating metallic material17%
C25DProcesses for the electrolytic or electrophoretic production of coatings17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
8,900,472'Texturing and cleaning agent for the surface treatment of wafers and use thereof'20148,586,402'Method for the precision processing of substrates'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2014Patents assigned to KRAY DANIEL (2)· patent assignee history
2013–2014Patents assigned to MAYER KUNO (2)· patent assignee history
2013Patents assigned to ALEMAN MONICA (1)· patent assignee history
2013Patents assigned to FRAUNHOFER GES FORSCHUNG (1)· patent assignee history
2013Based in Freiburg, DE· patent location history
2014Patents assigned to BIRO DANIEL (1)· patent assignee history
2014Based in Frankfurt am Main, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KRAY DANIEL22013–2014
MAYER KUNOself22013–2014
ALEMAN MONICA12013
BIRO DANIEL12014
FRAUNHOFER GES FORSCHUNG12013
Locations
LocationPatentsSpan
Frankfurt am Main, DE12014
Freiburg, DE12013