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Inventor

Hirokazu Shimada

Inventor
Shizuoka, JP

Overview

17→
Patents
1992–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Mprimary
B41MPrinting, duplicating, marking, or copying processes24%
G03CPhotosensitive materials for photographic purposes24%
H04BTransmission12%
H04WWireless communication networks8%
G05BControl or regulating systems in general4%
G06FElectric digital data processing4%
G10LSpeech analysis techniques or speech synthesis4%
H03HImpedance networks, e.g. resonant circuits4%
H04JMultiplex communication4%
H04LTransmission of digital information, e.g. telegraphic communication4%
PatentTitleYear
9,794,018'Optical network system and optical communication method'20178,582,494'Data relay device and frame processing method by the same'20138,385,816'Relay device and relay method'20138,283,005'Inkjet recording medium and method of manufacturing the same'20128,274,166'Semiconductor device and method of manufacturing the same'20128,257,803'Inkjet recording medium and inkjet recording method'20128,186,827'Inkjet recording medium and inkjet recording method'20128,084,106'Inkjet recording medium and method of manufacturing the same'20117,698,418'Monitoring system'20106,872,687'Thermosensitive recording material'20056,767,861'Heat-sensitive recording material'20046,704,369'Apparatus and method for signal separation and recording medium for the same'20045,945,247'Heat development duplicating material comprising ascorbic acid'19995,407,777'Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(phenidone) as an anti-oxidant'19955,338,642'Diazo type recording material comprising two couplers wherein the novel coupler used is a bis-malonamide'19945,236,800'Heat-developable light-sensitive copying material comprising microcapsules having substantially no solvent'19935,089,371'Heat development type diazo copying material containing a light insensitive intermediate layer provided between the support and the photosensitive layer'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2005Patents assigned to FUJI PHOTO FILM CO LTD (7)· patent assignee history
1992–2005Based in Shizuoka, JP· patent location history
2010–2017Patents assigned to FUJITSU LTD (4)· patent assignee history
2010Based in Yokohama, JP· patent location history
2011–2013Patents assigned to SHIMADA HIROKAZU (7)· patent assignee history
2011–2012Patents assigned to FUJIFILM CORP (4)· patent assignee history
2011–2012Based in Fujinomiya, JP· patent location history
2012Patents assigned to KUBOTA TOMOYA (2)· patent assignee history
2012–2017Based in Kanagawa, JP· patent location history
2013Based in Kawasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJI PHOTO FILM CO LTD71992–2005
SHIMADA HIROKAZUself72011–2013
FUJIFILM CORP42011–2012
FUJITSU LTD42010–2017
KUBOTA TOMOYA22012
Locations
LocationPatentsSpan
Shizuoka, JP71992–2005
Fujinomiya, JP42011–2012
Kanagawa, JP22012–2017
Kawasaki, JP22013
Yokohama, JP12010