Inventor
Martin E. Lee
Inventor
Saratoga, CA, US
Overview
Patents· 43 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
Y10TTechnical subjects covered by former us classification27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H01JElectric discharge tubes or discharge lamps4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
F16CShafts2%
G01BMeasuring length, thickness or similar linear dimensions2%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling1%
F15BSystems acting by means of fluids in general1%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%
PatentTitleYear
8,767,172'Projection optical device and exposure apparatus'2014D0692886'Folio keyboard for tablet computer'20137,365,513'Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device'20087,333,179'Moving mechanism with high bandwidth response and low force transmissibility'20087,061,577'Image adjustor including damping assembly'20066,989,647'Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device'20066,927,840'Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device'20056,888,620'System and method for holding a device with minimal deformation'20056,882,126'Holder mover for a stage assembly'20056,872,958'Platform positioning system'20056,841,965'Guideless stage with isolated reaction stage'20056,747,732'Method of making exposure apparatus with dynamically isolated reaction frame'20046,683,433'Exposure apparatus and method utilizing isolated reaction frame'20046,646,719'Support assembly for an exposure apparatus'20036,590,639'Active vibration isolation system having pressure control'20036,471,435'Flexural joint'20026,355,994'Precision stage'20026,323,494'Vertical direction force transducer'20016,316,901'Exposure apparatus and method utilizing isolated reaction frame'20016,302,585'Two Axis stage with arcuate surface bearings'20016,281,654'Method for making apparatus with dynamic support structure isolation and exposure method'20016,271,640'Exposure apparatus having reaction frame'20016,246,202'Method of making exposure apparatus with dynamically isolated reaction frame'20016,188,195'Exposure method, and method of making exposure apparatus having dynamically isolated support structure'20016,175,404'Exposure apparatus having dynamically isolated reaction frame'20016,151,105'Exposure apparatus having dynamically isolated support structure'20006,150,787'Exposure apparatus having dynamically isolated reaction frame'20006,132,091'X-Y stage with arcuate surface bearings'20006,130,490'X-Y stage with movable magnet plate'20006,087,797'Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame'20006,049,186'Method for making and operating an exposure apparatus having a reaction frame'20006,020,710'Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame'20006,008,500'Exposure apparatus having dynamically isolated reaction frame'19995,982,128'Lithography apparatus with movable stage and mechanical isolation of stage drive'19995,942,871'Double flexure support for stage drive coil'19995,874,820'Window frame-guided stage mechanism'19995,838,450'Direct reticle to wafer alignment using fluorescence for integrated circuit lithography'19985,744,924'Guideless stage with isolated reaction frame'19985,708,505'Laser interferometer having a sheath for the laser beam'19985,552,888'Apparatus for measuring position of an X-Y stage'19965,528,118'Guideless stage with isolated reaction stage'19964,444,492'Apparatus for projecting a series of images onto dies of a semiconductor wafer'19844,425,037'Apparatus for projecting a series of images onto dies of a semiconductor wafer'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984Patents assigned to GEN SIGNAL CORP (2)· patent assignee history
1984–2008Based in Saratoga, CA, US· patent location history
1996–1998Patents assigned to NIKON PRECISION INC (3)· patent assignee history
1998–2014Patents assigned to NIKON CORP (34)· patent assignee history
2002–2005Patents assigned to MOTOROLA INC (3)· patent assignee history
2002–2005Patents assigned to MULTIBEAM SYSTEMS INC (3)· patent assignee history
2008–2014Based in San Jose, CA, US· patent location history
2013Based in Bade City, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 34 | 1998–2014 |
| MOTOROLA INC | 3 | 2002–2005 |
| MULTIBEAM SYSTEMS INC | 3 | 2002–2005 |
| NIKON PRECISION INC | 3 | 1996–1998 |
| GEN SIGNAL CORP | 2 | 1984 |
Locations
| Location | Patents | Span |
|---|---|---|
| Saratoga, California, US | 40 | 1984–2008 |
| San Jose, California, US | 2 | 2008–2014 |
| Bade City, TW | 1 | 2013 |