Inventor

Christophe De Metsenaere

Inventor
Eindhoven, NL

Overview

8→
Patents
2013–2019
Patent span
Physics
Primary field (CPC G)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices54%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them8%
Y10TTechnical subjects covered by former us classification8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2019Patents assigned to ASML NETHERLANDS BV (8)· patent assignee history
2013–2014Patents assigned to BERKVENS PAUL PETRUS JOANNES (5)· patent assignee history
2013–2014Patents assigned to DE METSENAERE CHRISTOPHE (5)· patent assignee history
2013–2014Patents assigned to DIRECKS DANIEL JOZEF MARIA (3)· patent assignee history
2013–2014Patents assigned to JANSSEN FRANCISCUS JOHANNES JOSEPH (3)· patent assignee history
2013–2019Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV82013–2019
BERKVENS PAUL PETRUS JOANNES52013–2014
DE METSENAERE CHRISTOPHEself52013–2014
DIRECKS DANIEL JOZEF MARIA32013–2014
JANSSEN FRANCISCUS JOHANNES JOSEPH32013–2014
Locations
LocationPatentsSpan
Eindhoven, NL82013–2019