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Inventor

YUJIRO ISHIHARA

Inventor
JP

Overview

2→
Patents
2023
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material20%
C30BSingle-crystal growth20%
C01BNon-metallic elements10%
G01RMeasuring electric variables10%
H01LSemiconductor devices10%
H10HInorganic light-emitting semiconductor devices having potential barriers10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
Y10TTechnical subjects covered by former us classification10%
PatentTitleYear
11,680,339Method of manufacturing group III nitride semiconductor substrate, group III nitride semiconductor substrate, and bulk crystal202311,662,374Group III nitride semiconductor substrate2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to FURUKAWA CO LTD (2)· patent assignee history
2023Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FURUKAWA CO LTD22023
Locations
LocationPatentsSpan
JP22023