Inventor
David H. Tracy
Inventor
Norwalk, CT, US
Overview
Patents· 50 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties32%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light19%
B01LChemical or physical laboratory apparatus for general use6%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms5%
H01JElectric discharge tubes or discharge lamps5%
B82YSpecific uses or applications of nanostructures4%
G02BOptical elements, systems or apparatus4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
A61BDiagnosis2%
PatentTitleYear
9,817,016'Low cost optical high speed discrete measurement system'20179,801,578'Reduced size optical coupler for fluorescence detection'20179,766,261'Low cost optical high speed discrete measurement system'20179,228,898'Scalable spectroscopic detection and measurement'20169,068,947'Optical system for multiple reactions'20158,987,685'Optical system for multiple reactions'20158,659,755'Luminescence reference standards'20148,373,854'Luminescence reference standards'20138,060,328'Method and apparatus for quantitating surface-binding optical resonance profiles'20117,871,183'Light source'20117,822,568'Method and apparatus for quantitating surface-binding optical resonance profiles'20107,742,164'Luminescence reference standards'20107,656,521'Method of instrument standardization for a spectroscopic device'20107,480,042'Luminescence reference standards'20097,405,821'Method of instrument standardization for a spectroscopic device'20087,397,546'Systems and methods for reducing detected intensity non-uniformity in a laser beam'20087,372,564'Light source'20087,251,085'Optical resonance analysis system'20077,145,650'Method of instrument standardization for a spectroscopic device'20067,088,445'Light source'20066,873,417'Optical resonance analysis system'20056,600,563'Optical resonance analysis system'20036,438,147'Tunable external cavity diode laser'20026,430,513'Monitoring constituents of an animal organ using statistical correlation'20026,180,942'Ion detector, detector array and instrument using same'20016,138,082'Standardizing between analytical instruments'20006,049,762'Standardizing a spectrometric instrument'20006,033,880'Nucleic acid amplification reaction apparatus and method'20006,029,115'Analyzing spectrometric data'20006,015,674'Apparatus and method for detecting nucleic acid amplification products'20005,928,907'System for real time detection of nucleic acid amplification products'19995,915,269'Method and apparatus to compensate for gas chromatograph column permeability'19995,720,923'Nucleic acid amplification reaction apparatus'19985,528,370'Apparatus and method for measuring variations in thickness of an optical interference element'19965,526,451'Photometric instrument with optical fibers for analyzing remote samples'19965,481,631'Optical switching apparatus with retroreflector'19965,465,608'Saw vapor sensor apparatus and multicomponent signal processing'19955,428,558'Correction of spectra for stray radiation'19955,428,696'Photometric instrument with optical fibers for analyzing remote samples'19955,412,468'Grouping of spectral bands for data acquisition in a spectrophotometer'19955,308,982'Method and apparatus for comparing spectra'19945,303,165'Standardizing and calibrating a spectrometric instrument'19945,229,838'Photodetector amplitude linearity'19934,804,978'Exposure control system for full field photolithography using pulsed sources'19894,795,257'Polychromator for multi-element analysis'19894,640,627'Apparatus for monitoring a plasma torch'19874,626,312'Plasma etching system for minimizing stray electrical discharges'19864,617,079'Plasma etching system'19864,615,755'Wafer cooling and temperature control for a plasma etching system'19864,612,077'Electrode for plasma etching system'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–2000Patents assigned to PERKIN ELMER CORP (20)· patent assignee history
1986–2015Based in Norwalk, CT, US· patent location history
2003–2007Patents assigned to APPLERA CORP (3)· patent assignee history
2006–2010Patents assigned to PERKINELMER LAS INC (3)· patent assignee history
2010–2014Patents assigned to APPLIED BIOSYSTEMS LLC (3)· patent assignee history
2011–2016Patents assigned to TRACY DAVID H (3)· patent assignee history
2016Based in Cambridge, MA, US· patent location history
2017Based in Champaign, IL, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PERKIN ELMER CORP | 20 | 1986–2000 |
| APPLERA CORP | 3 | 2003–2007 |
| APPLIED BIOSYSTEMS LLC | 3 | 2010–2014 |
| PERKINELMER LAS INC | 3 | 2006–2010 |
| TRACY DAVID Hself | 3 | 2011–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Norwalk, CT, US | 46 | 1986–2015 |
| Champaign, Illinois, US | 3 | 2017 |
| Cambridge, Massachusetts, US | 1 | 2016 |