Inventor
Yosuke Ono
Inventor
Sodegaura, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form6%
G02BOptical elements, systems or apparatus6%
H01LSemiconductor devices6%
Y10TTechnical subjects covered by former us classification6%
B29CShaping or joining of plastics3%
B29DProducing particular articles from plastics or from substances in a plastic state3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
B29LIndexing scheme associated with subclass b29c, relating to particular articles3%
PatentTitleYear
10,606,169Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle202010,585,348Pellicle, pellicle production method and exposure method using pellicle202010,488,751Pellicle, production method thereof, exposure method201910,261,411Pellicle film, pellicle frame, pellicle, and method for producing same201910,216,081Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device201910,185,217Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device201910,106,660Film containing a resin having a thiourethane bond and uses thereof201810,108,084Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device20189,841,670'Support frame for pellicles'20179,776,387'Method for producing transparent adhesive sheet for optical applications, transparent adhesive sheet for optical applications, and display device using same'20179,703,187'Pellicle and EUV exposure device comprising same'20179,242,504'Method and product of hydraulic transfer'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2017Patents assigned to TAICA CORP (2)· patent assignee history
2016Patents assigned to IKEDA WATARU (1)· patent assignee history
2016Patents assigned to ONO YOSUKE (1)· patent assignee history
2016–2017Based in Tokyo, JP· patent location history
2017–2020Patents assigned to MITSUI CHEMICALS INC (8)· patent assignee history
2017Patents assigned to NIPPON LIGHT METAL CO (1)· patent assignee history
2017–2020Based in Sodegaura, JP· patent location history
2017Based in Chiba, JP· patent location history
2018Based in Ichihara, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUI CHEMICALS INC | 8 | 2017–2020 |
| TAICA CORP | 2 | 2016–2017 |
| IKEDA WATARU | 1 | 2016 |
| NIPPON LIGHT METAL CO | 1 | 2017 |
| ONO YOSUKEself | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sodegaura, JP | 8 | 2017–2020 |
| Tokyo, JP | 2 | 2016–2017 |
| Ichihara, JP | 1 | 2018 |
| Chiba, JP | 1 | 2017 |