Inventor
Mami Nishimura
Inventor
Sodegaura, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C04Bprimary
C04BLime, magnesia23%
C23CCoating metallic material23%
H01LSemiconductor devices15%
H10DInorganic electric semiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H01BCables4%
H01JElectric discharge tubes or discharge lamps4%
PatentTitleYear
10,196,733Sputtering target20199,214,519'In2O3—SnO2—ZnO sputtering target'20159,206,502'In—Ga—Zn oxide sputtering target and method for producing same'20159,054,196'Sputtering target comprising an oxide sintered body comprising In, Ga, and Zn'20158,999,208'In-Ga-Sn oxide sinter, target, oxide semiconductor film, and semiconductor element'20158,641,930'In—Ga—Zn type oxide sputtering target'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2019Patents assigned to IDEMITSU KOSAN CO (6)· patent assignee history
2014–2015Patents assigned to ITOSE MASAYUKI (5)· patent assignee history
2014–2015Patents assigned to NISHIMURA MAMI (5)· patent assignee history
2014–2015Patents assigned to YANO KOKI (4)· patent assignee history
2014Based in Chiba, JP· patent location history
2015Patents assigned to KASAMI MASASHI (4)· patent assignee history
2015–2019Based in Sodegaura, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IDEMITSU KOSAN CO | 6 | 2014–2019 |
| ITOSE MASAYUKI | 5 | 2014–2015 |
| NISHIMURA MAMIself | 5 | 2014–2015 |
| KASAMI MASASHI | 4 | 2015 |
| YANO KOKI | 4 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sodegaura, JP | 5 | 2015–2019 |
| Chiba, JP | 1 | 2014 |