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Inventor

Yasuyoshi Kuroka

Inventor
Yawara-mura, JP

Overview

2→
Patents
2000–2001
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing100%
PatentTitleYear
6,332,828'Method of and apparatus for mirror-like polishing wafer chamfer with orientation flat'20016,113,463'Method of and apparatus for mirror-like polishing wafer chamfer with orientation flat'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to FUJIKOSHI MACHINERY CORP (2)· patent assignee history
2000–2001Patents assigned to SHINETSU HANDOTAI KK (2)· patent assignee history
2000Based in Fukushima, JP· patent location history
2001Based in Yawara-mura, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIKOSHI MACHINERY CORP22000–2001
SHINETSU HANDOTAI KK22000–2001
Locations
LocationPatentsSpan
Yawara-mura, JP12001
Fukushima, JP12000