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Inventor

George L. Mack

Inventor
Pleasant Valley, NY, US

Overview

3→
Patents
1989–2011
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
B01DSeparation20%
B08BCleaning in general20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
7,967,978'Method and apparatus for filter conditioning'20116,764,551'Process for removing dopant ions from a substrate'20044,828,964'Polyimide formulation for forming a patterned film on a substrate'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–2011Patents assigned to IBM (3)· patent assignee history
1989–2011Based in Pleasant Valley, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM31989–2011
Locations
LocationPatentsSpan
Pleasant Valley, New York, US31989–2011