Inventor
DONGSEOK HAN
Inventor
KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling8%
F16JPistons8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01LSemiconductor devices8%
H01QAntennas, i.e. radio aerials8%
H02NElectric machines not otherwise provided for8%
H05HPlasma technique8%
PatentTitleYear
12,546,393Substrate processing apparatus202612,476,089Plasma processing apparatus202512,222,362Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer202512,183,555Substrate processing apparatus and method of manufacturing semiconductor device using the same2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (4)· patent assignee history
2024–2026Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 4 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 4 | 2024–2026 |