Inventor
RAMESH CHANDRASEKHARAN
Inventor
US
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C23CCoating metallic material19%
H01JElectric discharge tubes or discharge lamps17%
H01LSemiconductor devices16%
H05BElectric heating5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%
F16KValves2%
F17DPipe-line systems2%
G01KMeasuring temperature2%
G05DSystems for controlling or regulating non-electric variables2%
PatentTitleYear
12,531,220Automated feedforward and feedback sequence for patterning CD control202612,322,617Dual zone heaters for metallic pedestals202512,308,264Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports202512,266,509Multilayer coatings of component parts for a work piece processing chamber202512,209,312Temperature control of a multi-zone pedestal202512,209,310Concentration control using a bubbler202512,186,851Use of vacuum during transfer of substrates202512,142,509Electrostatic chuck with seal surface202412,110,586Pedestals for modulating film properties in atomic layer deposition (ALD) substrate processing chambers202412,071,689Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes202412,062,554Progressive heating of components of substrate processing systems using TCR element-based heaters202412,049,698Systems and methods for reducing effluent build-up in a pumping exhaust system202411,959,175Fill on demand ampoule refill202411,959,172Substrate processing systems including gas delivery system with reduced dead legs202411,908,715Dynamic temperature control of substrate support in substrate processing system202411,725,282Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region202311,661,654Substrate processing systems including gas delivery system with reduced dead legs202311,443,975Planar substrate edge contact with open volume equalization pathways and side containment202211,332,824Systems and methods for reducing effluent build-up in a pumping exhaust system202211,236,422Multi zone substrate support for ALD film property correction and tunability202211,232,966Electrostatic chucking pedestal with substrate backside purging and thermal sinking202211,183,400Progressive heating of components of substrate processing systems using TCR element-based heaters2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to LAM RES CORP (21)· patent assignee history
2021–2026Based in US· patent location history
2023Patents assigned to NOVELLUS SYSTEMS INC (1)· patent assignee history
2025Patents assigned to LAM RESEARH CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 21 | 2021–2026 |
| LAM RESEARH CORP | 1 | 2025 |
| NOVELLUS SYSTEMS INC | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 22 | 2021–2026 |