Inventor
Shena JIA
Inventor
CN
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
B08BCleaning in general17%
B01DSeparation8%
F04BPositive-displacement machines for liquids8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
12,544,807Wafer cleaning apparatus202612,482,697Substrate supporting apparatus202512,334,367Method and apparatus for removing particles or photoresist on substrates202512,186,684Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device202511,925,881Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device202411,498,100Apparatus for cleaning semiconductor substrates202211,462,423Method and apparatus for cleaning semiconductor wafer2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to ACM RESEARCH SHANGHAI INC (7)· patent assignee history
2022–2026Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ACM RESEARCH SHANGHAI INC | 7 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| CN | 7 | 2022–2026 |