LexDanaLexDanabeta
Inventor

Boodeuk Kim

Inventor
Suwon-si, KR

Overview

1→
Patents
2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
9,676,892'Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to CHOI AHREUM (1)· patent assignee history
2017Patents assigned to CHOI JUNGSIK (1)· patent assignee history
2017Patents assigned to KIM BOODEUK (1)· patent assignee history
2017Patents assigned to KIM MYEONG KOO (1)· patent assignee history
2017Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2017Based in Suwon-si, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHOI AHREUM12017
CHOI JUNGSIK12017
KIM BOODEUKself12017
KIM MYEONG KOO12017
SAMSUNG ELECTRONICS CO LTD12017
Locations
LocationPatentsSpan
Suwon-si, KR12017