Inventor
Roelof Frederik De Graaf
Inventor
Veldhoven, NL
Overview
Patents· 51 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
B01DSeparation4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
C09JAdhesives3%
H01LSemiconductor devices3%
Y10TTechnical subjects covered by former us classification3%
G06FElectric digital data processing1%
PatentTitleYear
10,705,439Lithographic apparatus and device manufacturing method202010,684,554Lithographic apparatus and device manufacturing method202010,599,054Lithographic apparatus and device manufacturing method202010,488,759Lithographic apparatus and device manufacturing method201910,451,973Lithographic apparatus and device manufacturing method201910,353,296Lithographic apparatus and device manufacturing method201910,331,047Lithographic apparatus and device manufacturing method201910,248,033Lithographic apparatus and device manufacturing method201910,025,196Lithographic apparatus and device manufacturing method20189,904,185'Lithographic apparatus and device manufacturing method'20189,785,061'Lithographic apparatus and in-line cleaning apparatus'20179,753,380'Lithographic apparatus and device manufacturing method'20179,606,449'Lithographic apparatus and device manufacturing method'20179,507,278'Lithographic apparatus and device manufacturing method'20169,488,923'Lithographic apparatus and device manufacturing method'20169,477,153'Lithographic apparatus and device manufacturing method'20169,436,097'Lithographic apparatus and device manufacturing method'20169,405,205'Lithographic apparatus and in-line cleaning apparatus'20169,229,335'Lithographic apparatus and device manufacturing method'20169,146,478'Lithographic apparatus and device manufacturing method'20159,081,300'Lithographic apparatus and device manufacturing method'20159,036,128'Lithographic apparatus and in-line cleaning apparatus'20158,934,082'Lithographic apparatus and device manufacturing method'20158,860,924'Lithographic apparatus and device manufacturing method'20148,823,919'Lithographic apparatus, removable member and device manufacturing method'20148,755,028'Lithographic apparatus and device manufacturing method'20148,687,168'Lithographic apparatus and device manufacturing method'20148,681,308'Lithographic apparatus and device manufacturing method'20148,659,741'Lithographic apparatus, removable member and device manufacturing method'20148,587,762'Methods relating to immersion lithography and an immersion lithographic apparatus'20138,481,978'Lithographic apparatus and device manufacturing method'20138,446,563'Lithographic apparatus and device manufacturing method'20138,432,531'Lithographic apparatus and a method of operating the apparatus'20138,246,838'Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method'20128,248,577'Lithographic apparatus and device manufacturing method'20128,243,255'Lithographic apparatus and in-line cleaning apparatus'20128,138,486'Lithographic apparatus and device manufacturing method'20128,115,903'Lithographic apparatus and device manufacturing method'20128,107,053'Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid'20128,031,325'Lithographic apparatus and device manufacturing method'20118,004,652'Lithographic apparatus and device manufacturing method'20117,928,407'Lithographic apparatus and device manufacturing method'20117,929,112'Lithographic apparatus and device manufacturing method'20117,914,687'Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method'20117,701,550'Lithographic apparatus and device manufacturing method'20107,633,073'Lithographic apparatus and device manufacturing method'20097,602,470'Lithographic apparatus and device manufacturing method'20097,468,779'Lithographic apparatus and device manufacturing method'20087,433,016'Lithographic apparatus and device manufacturing method'20087,428,038'Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid'20087,378,025'Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2020Patents assigned to ASML NETHERLANDS BV (51)· patent assignee history
2008–2020Based in Veldhoven, NL· patent location history
2012–2016Patents assigned to DE GRAAF ROELOF FREDERIK (21)· patent assignee history
2012–2016Patents assigned to LEENDERS MARTINUS HENDRIKUS ANTONIUS (13)· patent assignee history
2012–2016Patents assigned to DONDERS SJOERD NICOLAAS LAMBERTUS (12)· patent assignee history
2012–2016Patents assigned to HOOGENDAM CHRISTIAAN ALEXANDER (12)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 51 | 2008–2020 |
| DE GRAAF ROELOF FREDERIKself | 21 | 2012–2016 |
| LEENDERS MARTINUS HENDRIKUS ANTONIUS | 13 | 2012–2016 |
| DONDERS SJOERD NICOLAAS LAMBERTUS | 12 | 2012–2016 |
| HOOGENDAM CHRISTIAAN ALEXANDER | 12 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 51 | 2008–2020 |