Inventor
Naoki Hiraoka
Inventor
Tokyo, JP
Overview
Patents· 37 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Dprimary
G01DMeasuring not specially adapted for a specific variable21%
G01RMeasuring electric variables18%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock13%
Y10TTechnical subjects covered by former us classification13%
B24BMachines, devices, or processes for grinding or polishing10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B01FMixing, e.g. dissolving, emulsifying or dispersing5%
B29CShaping or joining of plastics4%
B82YSpecific uses or applications of nanostructures3%
G01VGeophysics3%
PatentTitleYear
7,863,195'Chemical solution feeding apparatus and method for preparing slurry'20117,705,584'Magnetic sensor'20107,557,041'Apparatus and method for supplying chemicals'20097,468,604'Magnetic detector maintaining high detection precision without affected by the temperature characteristics of the sensing element'20087,419,946'Chemical solution feeding apparatus and method for preparing slurry'20087,265,541'Magnetic sensor'20077,208,417'Apparatus and method for supplying chemicals'20077,157,904'Magnetic detection apparatus'20077,084,620'Magnetic detection apparatus'20067,045,997'Magnetic detection apparatus'20066,874,929'Apparatus and method for supplying chemicals'20056,870,365'Rotation detecting device'20056,659,634'Chemical solution feeding apparatus and method for preparing slurry'20036,661,221'Magnetic field sensing element and device having magnetoresistance element and integrated circuit formed on the same substrate'20036,630,821'Magnetic detection device for detecting moving direction of a toothed magnetic movable body'20036,457,852'Apparatus and method for supplying chemicals'20026,427,316'Manufacturing method of a rotation sensor'20026,426,620'Magnetic field sensing element and device having magnetoresistance element and integrated circuit formed on the same substrate'20026,339,324'Rotating magnetic object motion sensor with unbalanced bias'20026,326,779'Magnetic detector having separate base and connector units and production process therefor'20016,239,595'Magnetic field sensing element'20016,211,669'Magnetic detector with improved noise resistance characteristics'20016,140,813'Rotating magnetic object motion sensor with unbalanced bias'20006,061,895'Manufacturing method of a rotation sensor'20006,054,850'Magnetic sensor unit for combining a specific magnetic sensor with a specific receiving unit'20006,014,023'High resolution magnetoresistance sensing device with accurate placement of inducing and detecting elements'20006,008,639'Magnetic sensor having a main electrical circuit base with a crack forming area'19995,982,171'Sensing device for detecting the angular displacement and relative position of a member of magnetic material'19995,952,824'Magnetic detecting apparatus with giant magnetoresistive sensing element and level shifting waveform processing circuit'19995,929,629'Magnetic sensor having a liquid seal'19995,877,626'Temperature resistant magnetoresistance sensing device'19995,821,744'Rotation sensor having a simplified and compact structure'19985,801,529'Magnetoresistance sensing device without hystersis influence'19985,789,919'Magnetoresistance sensing device with increased magnetic field detection efficiency'19985,789,925'Sensor system having abnormality detecting circuit for detecting abnormality of sensor system from outputs of signal processing circuits'19985,676,590'Polishing apparatus provided with abrasive cloth'19975,458,509'Ignition coil device for internal combustion engine'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2010Patents assigned to MITSUBISHI ELECTRIC CORP (29)· patent assignee history
1995Based in Hyogo, JP· patent location history
1997–2008Patents assigned to FUJITSU LTD (5)· patent assignee history
1997–2011Based in Kasugai, JP· patent location history
1998–2010Based in Tokyo, JP· patent location history
2003Patents assigned to FUJITSU VLSI LTD (1)· patent assignee history
2009Patents assigned to FUJITSU MICROELECTRONICS LTD (1)· patent assignee history
2011Patents assigned to FUJITSU SEMICONDUCTOR LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 29 | 1995–2010 |
| FUJITSU LTD | 5 | 1997–2008 |
| FUJITSU MICROELECTRONICS LTD | 1 | 2009 |
| FUJITSU SEMICONDUCTOR LTD | 1 | 2011 |
| FUJITSU VLSI LTD | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 28 | 1998–2010 |
| Kasugai, JP | 8 | 1997–2011 |
| Hyogo, JP | 1 | 1995 |